Material Modification by Powerful Pulsed Ion Beams

Ремнев, Г. Е.; Tarbokov, V. A.; Pavlov, S. K.

doi:10.1134/s2075113322030327

Cited by 4 publications

(2 citation statements)

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“…Alternative methods for modifying the near-surface properties of metals and alloys are based on the energy impact on the surface. The impact of laser radiation [6], high-current electron beam [7], powerful plasma fluxes [8], or powerful ion beams [9,10] is based on pulsed heating of the surface layer, up to melting and even evaporation, followed by ultrafast heat transfer into the material due to its thermal conductivity.…”

Section: Introductionmentioning

confidence: 99%

“…The high-intensity ion beam material modification method (Figure 1) is implemented at ion current densities from 10 to 10 3 A/cm 2 and accelerating voltages from 100 to 1000 kV [9,10]. Such ion beams with a pulse duration of several tens, and sometimes hundreds of nanoseconds, provide energy input to the near-surface layer when the surface is superfast heated to temperatures corresponding to the melting and even evaporation of the irradiated target material.…”

Section: Introductionmentioning

confidence: 99%

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Influence of Surface Sputtering during High-Intensity, Hot Ion Implantation on Deep Alloying of Martensitic Stainless Steel

Ryabchikov,

Korneva,

Ivanova

et al. 2023

Metals

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This article is devoted to the study of the effect of ion sputtering on the alloy surface, using the example of martensitic stainless steel AISI 420 with ultrahigh-dose, high-intensity nitrogen ion implantation on the efficiency of accumulation and transformation of the depth distribution of dopants. Some patterns of change in the depth of ion doping depending on the target temperature in the range from 400 to 650 °C, current density from 55 to 250 mA/cm2, and ion fluence up to 4.5 × 1021 ion/cm2 are studied. It has been experimentally established that a decrease in the ion sputtering coefficient of the surface due to a decrease in the energy of nitrogen ions from 1600 to 350 eV, while maintaining the ion current density, ion irradiation fluence and temperature mode of target irradiation increases the ion-doped layer depth by more than three times from 25 μm to 65 µm. The efficient diffusion coefficient at an ion doping depth of 65 μm is many times greater than the data obtained when stainless steel is nitrided with an ion flux with a current density of about 2 mA/cm2.

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