. Although optical properties of InGaN/GaN quantum well structures are being widely investigated, the emission mechanisms in this system are still not completely understood [1][2][3][4][5][6][7]. Localised excitons is the most probable mechanism responsible for emission from InGaN/GaN MQWs, however the emission efficiency is highly sensitive to impurity and interface states, inhomogeneities and compositional separation of the InGaN alloy as well as to built-in electric field [3][4][5][6][7].Here we report on a study of InGaN/GaN MQW structures with various well thickness, d, by temperature-dependent, excitation power-dependent and time-resolved photoluminescence techniques. The samples were grown on sapphire substrates by metalorganic chemical vapour deposition. The undoped MQW structures were grown at temperatures of 1020 and 720 C for GaN and InGaN, respectively, and consisted of five periods of 10 nm thick GaN barriers and In x Ga 1--x N (x 0.15) wells. A series of samples with d ¼ 2, 2.5, 3, 3.5, and 4 nm were investigated.Luminescence spectra of structures studied show two main bands originated from the QW and barrier/buffer layers (Fig. 1). These two bands dominate in the emission over a broad range of excitation intensities. The QW luminescence is Stokes shifted by about 220 meV in respect to the estimated bandgap. It is attributed to the localised excitons. The barrier/buffer related band is situated at the bandgap energy of GaN and is attributed to the free-carrier emission. The QW luminescence blueshifts with increasing exci-