Measurement and simulation of temperature dynamics under electron beam

Babin, S.; Gaevski, Mikhail; Konnikov, S. G.

doi:10.1116/1.1343488

Cited by 5 publications

(4 citation statements)

References 7 publications

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“…Babin et al measured the in situ temperature rise using a YBa 2 Cu 3 O 7 superconducting thermometer with 3 m spatial resolution. But, the experiment was conducted at a liquid nitrogen temperature 12 and it does not resemble the normal thermal environment of electron-beam writing. Iranmanesh and Pease reported silicon surface temperature measurement under electron-beam irradiation with a thin film thermocouple ͑TFTC͒, 13 but the spatial resolution was also larger than 2 m. Since the spatial resolution is a key factor in the highly localized resist heating measurement, TFTC is a good candidate because high spatial resolution can be achieved by minimizing its junction size.…”

Section: Introductionmentioning

confidence: 99%

Submicron thermocouple measurements of electron-beam resist heating

Chu¹,

Bilir²,

Pease³

et al. 2002

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Pattern distortion caused by resist heating is believed to contribute significantly to errors in feature size and pattern placement. A number of models have been proposed to predict the temperature rise of resist heating but experimental results are scarce. We fabricated and calibrated thin film gold/nickel thermocouples with (400 nm)2 junction size and used these to measure work-piece heating during electron-beam exposure. Irradiation by a 15 kV electron beam of 600 nA and 2 μm radius caused a temperature rise of 70 K, about 15% lower than the calculated result. The discrepancy may be due to the differences between the energy deposition profiles used in modeling and those prevailing in the experiments.

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Section: Introductionmentioning

confidence: 99%

Submicron thermocouple measurements of electron-beam resist heating

Chu¹,

Bilir²,

Pease³

et al. 2002

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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“…Some direct measurements of temperature increase by EB irradiation have been reported. 7,8) However, most heating studies have been carried out by simulations. [1][2][3][4][5][6][9][10][11][12][13][14][15] For example, Babin developed commercial software for simulating heating in a multilayer system.…”

Section: Introductionmentioning

confidence: 99%

“…[1][2][3][4][5][6][9][10][11][12][13][14][15] For example, Babin developed commercial software for simulating heating in a multilayer system. 7,9) It is known that the resist sensitivity increases or resist ablation occurs with irradiated resist temperature (heating effect). 3,5,[16][17][18] Recently, the heating effect has been attracting attention, especially in relation to critical dimension deviation in mask manufacturing.…”

Section: Introductionmentioning

confidence: 99%

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

Ikari¹,

Okamoto²,

Konda³

et al. 2020

Jpn. J. Appl. Phys.

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The photomask used in the lithography process has the important role of transferring circuit pattern images onto the photoresist. To meet the demand for increased photomask manufacturing throughput, the current density of electron beam (EB) writers has been increased. EB exposure locally increases the resist temperature on the mask substrate depending on various factors, including current density, shot size, and writing order. Resist sensitivity increases with irradiated resist temperature, a phenomenon known as “heating effect”. In this study, we reported the cause of the temperature-dependent sensitivity increase in a polyhydroxystyrene-type chemically amplified resist. The experimental results, including acid generation efficiency measurements and pulse radiolysis with changing temperature, suggest that the heating effect is mainly caused by the deprotonation efficiency associated with the radical cation of the base polymer.

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“…Resist heating was previously identified as one of the major contributors to errors in feature size and pattern placement. 10 However, their experiments were conducted at liquid nitrogen temperatures, which do not replicate the real-life thermal environment in electron beam mask writing. 4 -9 However, experimental data to verify those models are scarce due to the difficulty in conducting transient temperature measurements with sufficient spatial and temporal resolution.…”

Section: Introductionmentioning

confidence: 99%

Transient temperature measurements of resist heating using nanothermocouples

Chu

Wong

Goodson

et al. 2003

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Resist heating is one of the major factors that causes feature size variation and pattern displacement in photomask fabrication. A number of models have been published to predict the rise in temperature during resist heating, but no transient temperature experimental results are available to verify those models. We have fabricated thin film gold/nickel thermocouples with junction areas as small as 100 nm 2 on silicon and 500 nm 2 on quartz. Microsecond scale transient resist heating measurements were obtained using these thermocouples. Irradiation by a 15 keV, 150 nA electron beam of 1.7 m radius for 100 s yielded temperature rises at the resist bottom surface of approximately 62 K on quartz substrates and of 18 K on silicon substrates. Simulation results using a multilayer Green's function model are in reasonable agreement with these experimental data for smaller temperature rises but tend to overestimate by about 10% for larger rises in temperature. In our experiments, a 100 ms exposure is equivalent to a dose of 150 C/cm 2 . Under the same electron beam conditions electron dosages of 5 and 15 C/cm 2 result in temperature rises of 25 and 40 K, respectively, on quartz substrates.

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Measurement and simulation of temperature dynamics under electron beam

Cited by 5 publications

References 7 publications

Submicron thermocouple measurements of electron-beam resist heating

Submicron thermocouple measurements of electron-beam resist heating

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

Transient temperature measurements of resist heating using nanothermocouples

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