2014
DOI: 10.1103/physreva.89.063828
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Measurement errors in entanglement-assisted electron microscopy

Abstract: The major resolution-limiting factor in cryoelectron microscopy of unstained biological specimens is radiation damage by the very electrons that are used to probe the specimen structure. To address this problem, an electron microscopy scheme that employs quantum entanglement to enable phase measurement precision beyond the standard quantum limit has recently been proposed [Phys. Rev. A 85, 043810]. Here we identify and examine in detail measurement errors that will arise in the scheme. An emphasis is given to… Show more

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Cited by 7 publications
(3 citation statements)
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References 82 publications
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“…The high order correlation function can effectively depict the overlapped area between the sources. When the emitted light from the sources is coherented, the resolving ability can be enhanced by the factor of N with the * yshzhang@ustc.edu.cn help of detecting N -photon entangled states [16]. With incoherent light sources, the intensity of first order detecting is the summation of the each light's intensity [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…The high order correlation function can effectively depict the overlapped area between the sources. When the emitted light from the sources is coherented, the resolving ability can be enhanced by the factor of N with the * yshzhang@ustc.edu.cn help of detecting N -photon entangled states [16]. With incoherent light sources, the intensity of first order detecting is the summation of the each light's intensity [11,12].…”
Section: Introductionmentioning
confidence: 99%
“…There have recently been proposals of quantum electron microscopy (QEM) schemes that seek to approach the Heisenberg limit, where N ≃ δθ −1 . These proposals are based on either repeated use of single electrons [3][4][5][6][7][8][9][10], or the use of entanglement between electrons and superconducting qubits [11][12][13]. Both methods accumulate the small phase θ onto a quantum object k times, resulting in a phase kθ after k electron-passing events through the specimen, which is then measured.…”
mentioning
confidence: 99%
“…Moreover, the thickness of the "damage layer" generated by gallium focused ion beam milling on the resultant specimen surface "could probably be kept to around 5nm" [24]. A previous estimation of QEM performance, which considered inelastic scattering processes, assumed t = 17.5 nm [13]. The acceptable specimen thickness should obviously be greater for wide applicability of QEM possibly into ECT.…”
mentioning
confidence: 99%