2010
DOI: 10.1021/nl9033158
|View full text |Cite
|
Sign up to set email alerts
|

Measurement of Active Dopant Distribution and Diffusion in Individual Silicon Nanowires

Abstract: We have measured the radial distribution and diffusion of active dopant atoms in individual silicon nanowires grown by the vapor-liquid-solid (VLS) method. Our method is based on successive surface etching of a portion of a contacted nanowire, followed by measurement of the potential difference between the etched and unetched areas using Kelvin probe force microscopy (KPFM). The radial dopant distribution is obtained by fitting the measured potentials with a three-dimensional solution of Poisson equation. We f… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

7
144
0
1

Year Published

2010
2010
2023
2023

Publication Types

Select...
7
1
1

Relationship

3
6

Authors

Journals

citations
Cited by 132 publications
(152 citation statements)
references
References 27 publications
7
144
0
1
Order By: Relevance
“…The radial dopant distribution was then obtained by fitting the measured potentials with a 3D solution of the Poisson equation as described previously. 21 Figure 1a shows a schematic illustration of an etched device following 4 etching steps. The nanowire selective etching was carried out by coating the sample with a thick layer of PMMA and defining windows by electron-beam lithography in the center of the contacted wire device as reported earlier.…”
mentioning
confidence: 99%
“…The radial dopant distribution was then obtained by fitting the measured potentials with a 3D solution of the Poisson equation as described previously. 21 Figure 1a shows a schematic illustration of an etched device following 4 etching steps. The nanowire selective etching was carried out by coating the sample with a thick layer of PMMA and defining windows by electron-beam lithography in the center of the contacted wire device as reported earlier.…”
mentioning
confidence: 99%
“…The doping of Si NW was quantitatively studied by Allen et al with scanning photocurrent microscopy (SPCM) [77]. Koren et al used Kelvin probe force microscopy (KPFM) and successive etching steps to obtain the radial distribution of dopants in Si NWs [144], and they also combined KPFM with SPCM to investigate the axial doping profile of Si NWs [145]. Scanning spreading resistance microscopy (SSRM) has also been used to measure the conductivity of NWs standing as-grown [146] as well as in cross-section [147].…”
Section: Scanning Probe Methodsmentioning
confidence: 99%
“…1,4 A typical diameters of the NWs are in the range of 20 6 5 nm and the axial orientation NWs are in the [110] direction. During the growth, the NWs were doped with boron with a ratio of Si:B 8000:1.…”
Section: Sample Processing and Measurementsmentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9][10] Unlike carbon nanotubes, Si based NWs can be synthesized with controlled diameters and doping levels for rational device design. Thermal and thermoelectric transport properties of these NWs are also of interest for potential use in thermoelectric power conversion applications.…”
Section: Introductionmentioning
confidence: 99%