Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology

Levinson, Zachary A.; Verduijn, Erik; Wood, O. R.; Mangat, Pawitter J. S.; Goldberg, Kenneth A.; Benk, Markus P.; Wojdyla, Antoine; Smith, Bruce W.

doi:10.1117/1.jmm.15.2.023508

Cited by 6 publications

(4 citation statements)

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“…[10][11][12][13] We have demonstrated this technique on several EUV optical systems. 11,9,13 In addition, we have developed a new algorithm based on principal component analysis (PCA). Although this results in a potentially lengthy model building step, the wavefront analysis step can be completed in under a quarter second.…”

Section: Introductionmentioning

confidence: 99%

“…[6][7][8] In addition, we have previously shown that amplitude pupil variation in EUV imaging systems can be non-uniform. 9 We have developed Quick Inverse Pupil (QUIP)-a software suite developed for rapid characterization of pupil plane behavior based on images formed by that system. Both pupil amplitude and phase variation can be extracted using this software.…”

Section: Introductionmentioning

confidence: 99%

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An automated image-based tool for pupil plane characterization of EUVL tools

Levinson

Smith

Fenger³

et al. 2016

SPIE Proceedings

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Pupil plane characterization will play a critical role in image process optimization for EUV lithography (EUVL), as it has for several lithography generations. In EUVL systems there is additional importance placed on understanding the ways that thermally-induced system drift affect pupil variation during operation. In-situ full pupil characterization is therefore essential for these tools. To this end we have developed Quick Inverse Pupil (QUIP)-a software suite developed for rapid characterization of pupil plane behavior based on images formed by that system. The software consists of three main components: 1) an image viewer, 2) the model builder, and 3) the wavefront analyzer. The image viewer analyzes CD-SEM micrographs or actinic mask micrographs to measure either CDs or through-focus intensity volumes. The software is capable of rotation correction and image registration with subpixel accuracy. The second component pre-builds a model for a particular imaging system to enable rapid pupil characterization. Finally, the third component analyzes the results from the image viewer and uses the optional pre-built model for inverse solutions of pupil plane behavior. Both pupil amplitude and phase variation can be extracted using this software. Inverse solutions are obtained through a model based algorithm which is built on top of commercial rigorous full-vector simulation software.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

An automated image-based tool for pupil plane characterization of EUVL tools

Levinson

Smith

Fenger³

et al. 2016

SPIE Proceedings

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“…Interferometric techniques [1][2][3][4][5][6][7] or adaptive optics, while widely used in the visible spectrum [8][9][10][11] , require complicated and expensive hardware, making them impractical in the EUV regime. One measurement approach used in EUV is to image precisely-calibrated test objects 12,13 such as gratings 14,15 , contact arrays 16,17 , or custom features 18 , which do not require modifying the system hardware. However, known test objects containing features with sizes near the resolution limit of the imaging system are difficult or expensive to fabricate with high fidelity.…”

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confidence: 99%

Extreme ultraviolet microscope characterization using photomask surface roughness

Gunjala

Wojdyla

Sherwin

et al. 2020

Sci Rep

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“…Measuring aberrations usually requires resolution targets [1], which are not readily available for the extreme ultraviolet (EUV) wavelength (λ = 13.5 nm) due to fabrication constraints. Previous EUV microscope characterization has used point-like contacts [2] and custom features [3], but they were limited to specific aberrations and relied on known patterns, often with imperfections and prone to sample-induced aberrations [4].…”

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confidence: 99%