2008
DOI: 10.1109/tsm.2008.2001222
|View full text |Cite
|
Sign up to set email alerts
|

Measuring Power Distribution System Resistance Variations

Abstract: Metal resistance variations in back-end-of-line processes can be significant, particularly during process bring-up. In this paper, we propose a simple method to measure resistance variations in the power distribution system (PDS) eof an IC. Our technique utilizes the PDS because it is an existing distributed resource in all ICs and provides a means of characterizing resistance in the context of the actual circuit design. By applying a set of tests using small on-chip support circuits attached to the PDS, the r… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
6
0

Year Published

2010
2010
2020
2020

Publication Types

Select...
2
2
1

Relationship

0
5

Authors

Journals

citations
Cited by 7 publications
(6 citation statements)
references
References 20 publications
0
6
0
Order By: Relevance
“…In research work conducted by Helinski , et al [59], a power grid architecture is adopted that is first proposed by Helinski and Plusquellic in [60] to design PG‐PUF. It is based on measuring equivalent resistance variations in the power distribution system of an IC.…”
Section: Literature Reviewmentioning
confidence: 99%
See 2 more Smart Citations
“…In research work conducted by Helinski , et al [59], a power grid architecture is adopted that is first proposed by Helinski and Plusquellic in [60] to design PG‐PUF. It is based on measuring equivalent resistance variations in the power distribution system of an IC.…”
Section: Literature Reviewmentioning
confidence: 99%
“…The scheme arises another problem that when two RO-PUF units' oscillators have exactly the same speed order. For example, two RO-PUF units U 1 and U 2 with the frequencies (80,60,70) and (40,20,30). The speed order for both units' oscillators is (3rd, 1st, 2nd), which results in the same response for a particular challenge.…”
Section: Ring Oscillator Puf: Suh and Devadas Introduced Ro-pufmentioning
confidence: 99%
See 1 more Smart Citation
“…This approach can also be used to determine the effective resistance in any two layer mesh structure with different horizontal and vertical unit resistances. The effective resistance of a mesh is used in power grid analysis [5], [6], substrate analysis [7], decoupling capacitance allocation [8]- [11], power dissipation [12] and electrostatic discharge (ESD) analysis [12], and measuring resistance variations in power distribution networks [13]. The effective resistance is used to determine the effective region of a decoupling capacitor [8], [14].…”
Section: Introductionmentioning
confidence: 99%
“…Manuscript received December 21, 2010 The effective resistance of a mesh is used in power grid analysis [5], [6], substrate analysis [7], decoupling capacitance allocation [8]- [11], power dissipation [12] and electrostatic discharge (ESD) analysis [12], and measuring resistance variations in power distribution networks [13]. The effective resistance is used to determine the effective region of a decoupling capacitor [8], [14].…”
Section: Introductionmentioning
confidence: 99%