2010
DOI: 10.1063/1.3358218
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Measuring the effects of low energy ion milling on the magnetization of Co/Pd multilayers using scanning electron microscopy with polarization analysis

Abstract: The dependence of the magnetization profile of Co/Pd multilayer films with very thin individual layers, Co(0.4 nm)/Pd(0.6 nm), on the energy of ion milling is investigated using scanning electron microscopy with polarization analysis (SEMPA). The effect of Ar ion milling on the Co/Pd magnetization angle distribution is compared for ion milling at 50 eV, 1 keV, and 2 keV. We find that 1 and 2 keV Ar ion milling causes a measurable change in the out-of-plane magnetization angle distribution as material is remove… Show more

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Cited by 11 publications
(11 citation statements)
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“…This difference might be attributed to the micro-structuring of the YIG waveguide by Ar ion beam etching. The etching might enhance the roughness of the edges of the YIG waveguides and the resist processing could have an influence on the surface quality 17,18 which could possibly lead to an enhancement of the two-magnon scattering process. 19 It would be desirable to perform FMR measurements on the YIG waveguide.…”
Section: Discussionmentioning
confidence: 99%
“…This difference might be attributed to the micro-structuring of the YIG waveguide by Ar ion beam etching. The etching might enhance the roughness of the edges of the YIG waveguides and the resist processing could have an influence on the surface quality 17,18 which could possibly lead to an enhancement of the two-magnon scattering process. 19 It would be desirable to perform FMR measurements on the YIG waveguide.…”
Section: Discussionmentioning
confidence: 99%
“…Ar + milling was performed on the substrates prior to the deposition of the MLs themselves. 15,16 Therefore, smoother surface and lower roughness substrates were found to be advantageous to the growth of higher coercivity Co/Pd MLs. The original purpose of Ar + milling was to remove the native silicon-oxide and relatively small particles from the substrate surface.…”
Section: A Effect Of Substrate Argon Ion Millingmentioning
confidence: 99%
“…12 Integrating the FORC-SFD over H R results in the total magnetization that is irreversible (M Irrev ). 13 Direct imaging of magnetic domains was performed using scanning electron microscopy with polarization analysis (SEMPA), 14 with the primary focus on the out-of-plane component of the magnetization. Prior to imaging, the samples were dc demagnetized, after saturation in a 1.5 T out-of-plane magnetic field.…”
mentioning
confidence: 99%