Mechanical properties of hard chromium tungsten nitride coatings

Hones, P.; Consiglio, R.; Randall, Nicholas X.; Lévy, F.

doi:10.1016/s0257-8972(99)00541-1

Cited by 75 publications

(37 citation statements)

References 14 publications

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“…2, which plots the abrasive wear rate of the investigated coatings as a function of their hardness. There is evidently a clear correlation between hardness and abrasive wear, which agrees with the results found in literature [12,13]. Tantalum carbide and molybdenum carbide coatings low in carbon content, i.e.…”

Section: Abrasive Wearsupporting

confidence: 91%

Tribological performance of TiN supported molybdenum and tantalum carbide coatings in abrasion and sliding contact

Martínez

Wiklund

Esteve

et al. 2002

Wear

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Section: Abrasive Wearsupporting

confidence: 91%

Tribological performance of TiN supported molybdenum and tantalum carbide coatings in abrasion and sliding contact

Martínez

Wiklund

Esteve

et al. 2002

Wear

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“…Alloy nitride coatings can be deposited by plasma vapor deposition as a hard chromium replacement because of their advanced wear resistance, high oxidation resistance and antiadhesion characteristics (low surface free energy). 7,8) The closed field unbalanced magnetron sputter ion plating (CFUBMSIP) for the deposition of high-quality alloy nitride films has been shown to be very effective. [9][10][11][12] The technique mainly reduces the loss of electrons from the discharge to the chamber walls, increasing the resulting ionisation in the discharge and the ion current density at a biased substrate.…”

Section: Introductionmentioning

confidence: 99%

Surface Free Energy of Alloy Nitride Coatings Deposited Using Closed Field Unbalanced Magnetron Sputter Ion Plating

et al. 2006

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The sticking of product material to injection molding tools is a serious problem, which reduces productivity and reliability. Depositing alloy nitride coatings (TiN, ZrN, CrN, and TiAlCrN) using closed field unbalanced magnetron sputter ion plating and electrodeposition of chromium, and characterizing their surface free energies in the temperature range 20-120 C have led to the development of a non-sticking (with a low surface free energy) coating system for semiconductor IC packaging molding dies. The contact angles of water, diiodomethane and ethylene glycol on the coated surfaces were measured at temperatures in the range 20-120 C using a Dataphysics OCA-20 contact angle analyzer. The surface free energy of the coatings and their components (dispersion and polar) were calculated using the Owens-Wendt geometric mean approach. The surface roughness of these coatings were investigated by atomic force microscopy (AFM). The adhesion force of these coatings were measured using direct tensile pull-off test apparatus. The experimental results revealed that TiAlCrN, CrN and ZrN coatings outperformed Hard-Cr and TiN coatings in terms of anti-adhesion, and thus have the potential as working layers for injection molding industrial equipment, especially in semiconductor IC packaging molding applications.

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“…WeAleN films show exceptional corrosion resistance and reduced tendency of tungsten to oxidize at elevated temperatures [24]. Ternary Cr 0.6 W 0.4 N films were found to exhibit a fine-grained dense morphology without apparent superstructure, low friction and high hardness [25]. CrN/WN superlattices have been shown to noticeably improve hardness over single layer CrN or WN films [26].…”

Section: Introductionmentioning

confidence: 99%

Growth of WC–Cr–N and WC–Al–N coatings in a RF-magnetron sputtering process

Stanishevsky

Walock

Zou

et al. 2013

Vacuum

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is an open access repository that collects the work of Arts et Métiers ParisTech researchers and makes it freely available over the web where possible. a b s t r a c tTungsten carbide-based coatings have been used in a wide variety of industrial applications such as high speed cutting tools, extrusion dies, drills, aerospace industries, and more. A few reports on ternary and quaternary coatings of WC with other elements indicate good prospects for these material systems. The present study focuses on the formation of quaternary WCeCreN and WCeAleN coatings during the simultaneous reactive RF-magnetron sputtering of tungsten carbide and Al or Cr targets in an argon/ nitrogen gas mixture. The resulting coatings, with thicknesses of 3.5 mme8.2 mm, were characterized by using several analytical techniques including X-ray diffraction, SEM/EDS, AFM, and X-ray photoelectron spectroscopy. WCeCreN and WCeAleN coatings with high levels of tungsten (i.e. more than 50 at.% of the total metal content) demonstrated dense microstructure. Coatings with lower tungsten content formed columnar grain microstructure, with different surface morphologies depending on the process parameters. It was proposed that crystalline tungsten carbide (with partial N-substitution of C atoms) and chromium (or aluminum) nitride phases coexist in the coatings when the amount of tungsten was greater than 50 at.% of the total metal content; while at lower tungsten content, the dominating crystalline phase is either W-doped CrN 1Ày or AlN 1Ày solid solution, with WC 1Àx and small amounts of free sp 2 -bonded carbon present as X-ray amorphous phases.

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Mechanical properties of hard chromium tungsten nitride coatings

Cited by 75 publications

References 14 publications

Tribological performance of TiN supported molybdenum and tantalum carbide coatings in abrasion and sliding contact

Tribological performance of TiN supported molybdenum and tantalum carbide coatings in abrasion and sliding contact

Surface Free Energy of Alloy Nitride Coatings Deposited Using Closed Field Unbalanced Magnetron Sputter Ion Plating

Growth of WC–Cr–N and WC–Al–N coatings in a RF-magnetron sputtering process

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