2017
DOI: 10.1063/1.4975200
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Mechanism and crucial parameters on GaN nanocluster formation in a silica matrix

Abstract: The formation of wurtzite GaN nanoclusters in an amorphous silica matrix, via gallium and nitrogen ion implantation and rapid thermal annealing, is identified using Extended X Ray Absorption Fine Structure analysis. The mechanism and the crucial parameters that rule the formation of the nanoclusters are established by the use of molecular dynamics simulations. The dominant structural parameters are found to be the concentration of the silicon and oxygen vacancies that are formed during the implantation and the… Show more

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Cited by 7 publications
(8 citation statements)
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“…This was counter-checked at room temperature on a couple of composite structures, with long runs. We expect movement and eventual merge of the nanoinclusions for temperatures higher than 1000 K as it has been observed in a previous work [24].…”
Section: Modeling the Structuressupporting
confidence: 80%
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“…This was counter-checked at room temperature on a couple of composite structures, with long runs. We expect movement and eventual merge of the nanoinclusions for temperatures higher than 1000 K as it has been observed in a previous work [24].…”
Section: Modeling the Structuressupporting
confidence: 80%
“…(a) an initial amorphous SiO 2 bulk was prepared with the desired structural characteristics (radial distribution function, density) [24]. The size of the SiO 2 box was 10.164 nm by 13.203 nm by 13.819 nm, with a total volume of 1854.44 nm 3 .…”
Section: Modeling the Structuresmentioning
confidence: 99%
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