2015 IEEE 42nd Photovoltaic Specialist Conference (PVSC) 2015
DOI: 10.1109/pvsc.2015.7355805
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Mechanism for formation of ultra thin SiNx on a-Si - XPS and FTIR studies

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“…59 The disappearance of the peak at 397.8 eV belongs to Si 3 N 4 in the N 1s orbital, implying the removal of Si 3 N 4 . 60 Briefly, after the removal of Si 3 N 4 from the surface of the cells by NaOH, the average surface purity of the obtained silicon wafers was 97.47 wt% with decreased N content of over 96% (from 11.37 to 0.37 wt%) (Fig. 7d).…”
Section: Resultsmentioning
confidence: 96%
“…59 The disappearance of the peak at 397.8 eV belongs to Si 3 N 4 in the N 1s orbital, implying the removal of Si 3 N 4 . 60 Briefly, after the removal of Si 3 N 4 from the surface of the cells by NaOH, the average surface purity of the obtained silicon wafers was 97.47 wt% with decreased N content of over 96% (from 11.37 to 0.37 wt%) (Fig. 7d).…”
Section: Resultsmentioning
confidence: 96%