Mechanism of enhanced plasma transport of vacuum arc plasma through curved magnetic ducts

Zhang, T.; Zeng, Zhi; Tian, Xiubo; Tang, Baoyin; Chu, Paul K.; Brown, Ian; Zhang, H. X.

doi:10.1116/1.582008

Cited by 12 publications

(3 citation statements)

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“…The ion flux increases at low voltage and exhibits a maximum. This result is similar to that of a collector plate current experiment [14], [15]. We subsequently simulate the ion trajectories and compute the throughput of standalone ions without any plasma electrons for different charge states at 0093-3813/00$10.00 © 2000 IEEE different bias and magnetic field using a particle-in-cell (PIC) method.…”

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confidence: 70%

“…At high field, the mean charge state is significantly lower than the unfiltered value [16]. The total throughput of the metal ions or ion flux can be measured by placing a collector plate in front of the duct exit and applying V to the collector plate to repel the electrons [14], [15]. As the bias voltage on the Bilek plate is increased, the current measured on the collector plate goes up, attains a maximum value, and finally reaches a plateau.…”

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confidence: 99%

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Ion mean charge state in a biased vacuum arc plasma duct

Kwok

Chu²,

Bilek³

et al. 2000

IEEE Trans. Plasma Sci.

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Vacuum arc or cathodic arc metal plasma sources are attractive and convenient for depositing high-quality thin metal films and metallurgical coatings. It is a common practice to use a curved magnetic filter duct to eliminate macroparticle contamination and to bias the duct wall with a positive voltage to enhance the throughput of the metal plasma. The metal plasma usually consists of several charge states and time-of-flight (TOF) experiments show that the mean charge state of the metal ions decreases with increasing bias and magnetic field applied to the filter duct. We also derive the throughput of ions with different charge states at different bias voltage and magnetic field by the particle-in-cell (PIC) method. The ion trajectory is simulated neglecting the influence of electron charge. Our results show that the simulated mean charge state displays a similar decreasing trend as the bias voltage and magnetic field strength are increased. Phenomena such as reduction of the mean charge state at high magnetic field strength and bias can be explained in terms of standalone multiply charged metal ions under the influences of magnetic and electric forces inside the filter duct. Index Terms-Ion charge states, plasma duct, vacuum arc sources. I. INTRODUCTION V ACUUM arc or cathodic arc metal plasma sources are widely used in plasma-based applications especially for the fabrication of thin films and coatings [1]-[4]. The process can be carried out either at high vacuum or in a low-pressure gaseous environment, and films can be composed of metals, ceramics, diamond-like carbon, some semiconductors and superconductors, and other materials. The method is thus a versatile and powerful plasma tool for the synthesis of novel and technologically interesting surfaces. The contamination of the thin metal films by macroparticles, droplets of resolidified cathode debris of dimensions in the broad range from 0.1 to 10 m, is the major disadvantage precluding a wide application of vacuum arc plasma sources in industry. Macroparticle contamination in general leads to imperfect films, and it is often important Manuscript

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confidence: 70%

mentioning

confidence: 99%

Ion mean charge state in a biased vacuum arc plasma duct

Kwok

Chu²,

Bilek³

et al. 2000

IEEE Trans. Plasma Sci.

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“…The most important parameters in designing and operating ducts are the bias voltage and the magnetic strength and configuration. Much of the research [5], [8], [9] has shown that magnetic ducts produce the maximum plasma output at certain duct bias, that is, the optimal duct bias. The positive bias value must be carefully selected to optimize the plasma output, and in order to do so, one needs to know how the various instrumental parameters are interrelated and how they influence the optimal bias.…”

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confidence: 99%