2004 Help me understand this report
Mechanism of high density plasma chemical vapor deposition phosphosilicate glass process without in-situ plasma chamber clean
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“…Variations in film quality of high density plasma phosphosilicate glass were studied by Lan and Wang. 471 Out-gassing of oxygen and moisture from the chemical vapour deposition chamber were found to be related to the P concentration. Wagner et al 472 used XRF and RBS to investigate amorphous films of the Ag-As-S system prepared by the spin-coating technique.…”
Section: Thin Films and Coatingsmentioning
confidence: 98%
“…Variations in film quality of high density plasma phosphosilicate glass were studied by Lan and Wang. 471 Out-gassing of oxygen and moisture from the chemical vapour deposition chamber were found to be related to the P concentration. Wagner et al 472 used XRF and RBS to investigate amorphous films of the Ag-As-S system prepared by the spin-coating technique.…”
Section: Thin Films and Coatingsmentioning
confidence: 98%
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