2014
DOI: 10.1063/1.4869230
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Mechanism of localized electrical conduction at the onset of electroforming in TiO2 based resistive switching devices

Abstract: The onset of localized current conduction during electroforming of TiO2-based resistive switching devices is investigated using a pulsed voltage method. The temperature rise at electroforming onset is found to vary from 25 to 300 °C as the pulse amplitude and the width are varied between 3–8 V and 10 ns–100 ms, respectively. The effective activation energy of the forming event is strongly electric field dependent and decreases from 0.7 eV at 3 V to almost zero at 8 V. The functional form of this dependence poi… Show more

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Cited by 21 publications
(26 citation statements)
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“…By its nature, this model is applicable not just to chalcogenide glasses but to most amorphous semiconductors exhibiting NDR. Noman et al 16 presented the transient thermometry data, consistent with the filament formation based on charge trapping model originally proposed for breakdown in SiO 2 . 16 They argued that the charge trapping can give rise to a local electric-field enhancement eventually causing a breakdown.…”
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confidence: 62%
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“…By its nature, this model is applicable not just to chalcogenide glasses but to most amorphous semiconductors exhibiting NDR. Noman et al 16 presented the transient thermometry data, consistent with the filament formation based on charge trapping model originally proposed for breakdown in SiO 2 . 16 They argued that the charge trapping can give rise to a local electric-field enhancement eventually causing a breakdown.…”
mentioning
confidence: 62%
“…17 This was confirmed experimentally in our TiO x and TaO x devices. 11 The filament, thus formed is volatile 16 as the I-V curves are fully reversible up to this point. While the temperature may increase during the initial thermal NDR beyond that of uniform heating, 11 the filament size at this stage is large and the temperature rise is limited to a range where it does not cause permanent changes in the device characteristics.…”
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confidence: 99%
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