Mechanism of tetraborate and silicate ions on the growth kinetics of microarc oxidation coating on a Ti6Al4V alloy

Abstract

B4O72− dissolves molten TiO2 at high temperature, exposing filamentary channels and resulting in the repeated nucleation of microarc in the same area. SiO2 formed from SiO32− blocks the channels and induces microarc nucleation in other regions.