1995
DOI: 10.1016/0921-5107(94)09003-3
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Mechanisms of layer growth during molecular beam epitaxy of semiconductor films

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Cited by 4 publications
(1 citation statement)
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“…While some studies analyze InAs heteroepitaxy on nanopatterned GaAs(001), there is a lack of knowledge on InAs growth on nanopatterned GaAs(111)A. The InAs/GaAs(111)A system is characterized by a low binding energy of In adatom sites [5] and slow In-Asx (x = 2, 4) reaction kinetics leading to a high In adatom mobility [6] and preference for 2D layer growth on planar GaAs(111)A [7,8]. These characteristics may provide the ground for the realization of tailored InAs nanostructures on nanopatterned GaAs(111)A.…”
Section: Introductionmentioning
confidence: 99%
“…While some studies analyze InAs heteroepitaxy on nanopatterned GaAs(001), there is a lack of knowledge on InAs growth on nanopatterned GaAs(111)A. The InAs/GaAs(111)A system is characterized by a low binding energy of In adatom sites [5] and slow In-Asx (x = 2, 4) reaction kinetics leading to a high In adatom mobility [6] and preference for 2D layer growth on planar GaAs(111)A [7,8]. These characteristics may provide the ground for the realization of tailored InAs nanostructures on nanopatterned GaAs(111)A.…”
Section: Introductionmentioning
confidence: 99%