Mechanistic Studies of Plasma Polymerization of Allylamine

Choukourov, Andrei; Biederman, Hynek; Slavı́nská, D.; Hanley, Luke; Grinevich, A.; Boldyryeva, H.; Macková, Anna

doi:10.1021/jp0535691

Cited by 107 publications

(103 citation statements)

References 77 publications

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“…Precursors such as alcohols, [3,4] carboxylic acids, [5,6] acid chlorides, [7,8] simple amines, [9,10] anhydrides, [11][12][13] and ethylene glycols [14,15] have been successfully deposited with a very high functional group density and various degrees of cross-link density. The surfaces deposited are generally marked by a high reactivity, characteristic of the functional groups they contain.…”

Section: Introductionmentioning

confidence: 99%

Recent and Expected Roles of Plasma‐Polymerized Films for Biomedical Applications

Förch¹,

Chifen²,

Bousquet³

et al. 2007

Chemical Vapor Deposition

144

125

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This review aims to provide a summary of some of the challenges in correlating surface science and biology, with particular emphasis on areas where plasma polymerization has and will play an important role as a method to synthesize reproducible and well-defined surfaces. Since the range of possible applications of plasma polymer films in biomaterial applications is immense, this paper will focus on processes to develop various surface morphologies and chemical structures for the immobilization of proteins and cells. Functional, plasma-polymerized films are discussed as biosensitive interfaces that may ultimately be part of a multilayer system that aims at connecting inorganic/metallic transducers with biologically reactive surfaces. These topics will be reviewed with some experimental results taken from the authors' own work. Specific aspects such as adhesion improvement and solvent effects are also discussed.

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Section: Introductionmentioning

confidence: 99%

Recent and Expected Roles of Plasma‐Polymerized Films for Biomedical Applications

Förch¹,

Chifen²,

Bousquet³

et al. 2007

Chemical Vapor Deposition

144

125

View full text Add to dashboard Cite

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“…A maximum N/C ratio of 0.19 was observed for a plasma power of 10 W. The highest N/C ratio is usually observed at lower powers due to greater retention of amine groups. [16] Further increasing the plasma power exhibited an overall downward trend with a minimum of 0.14 at 40 W. The decreasing N/C ratio with increasing plasma power has previously been observed [15,32,33] and is attributed to greater fragmentation at higher plasma powers. Previous studies of pAA deposited onto planar surfaces resulted in N/C ratios of 0.26-0.36, [32] higher than what was observed for quartz particles.…”

Section: Influence Of Plasma Power On Surface Chemistry and Humic Acimentioning

confidence: 56%

Optimizing Humic Acid Removal by Modifying the Surface Chemistry of Plasma Polymerized Allylamine Coated Particles

Jarvis

Majewski

2016

Plasma Processes & Polymers

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Plasma polymerized allylamine films were deposited onto quartz particles at low pressure to optimize humic acid removal by varying the plasma power, flow rate, and polymerization times. Increasing the plasma power increased the number of positively charged groups and humic acid removal. Increasing the allylamine flow rate increased the number of positively charged groups but maximum humic acid removal was observed at 6.48 sccm due to humic acid removal by positively charged and uncharged crosslinked species. Longer polymerization times increased the number of positively charged groups while similar humic acid removal resulted as the larger humic acid molecule cannot penetrate as readily into the film as the acid orange 7 used to determine the number of positively charged groups. Manipulation of the plasma parameters has shown to provide significant control over humic acid removal.

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“…In contrast, films deposited at p = 100 Pa exhibit a nanoporous structure developing with thickness t increasing to several nanometers [43] ( Figure 6B). The RMS roughness in this case is twice as much.…”

Section: Amine-containing Plasma Polymersmentioning

confidence: 95%