MEMS metrology techniques

Novak, Erik

doi:10.1117/12.596989

Cited by 27 publications

(12 citation statements)

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“…These systems can achieve nanometer-level measurement of out-of-plane motion of devices. The ability to measure motions up to several megahertz can be achieved by combining holographic techniques with stroboscopic methods [30].…”

Section: Digital Holographic Microscope Systemsmentioning

confidence: 99%

Metrology, Inspection, and Process Control in Micro‐Scales

Karhade

2011

Micro‐Manufacturing

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Section: Digital Holographic Microscope Systemsmentioning

confidence: 99%

Metrology, Inspection, and Process Control in Micro‐Scales

Karhade

2011

Micro‐Manufacturing

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“…An overview of several conventional tools used to characterize MEMS geometry is provided by Novak [5]. The tools include: optical microscopy, contact stylus profilometry, electron microscopy, interferometry microscopy, scanning confocal microscopy, atomic force microscopy, atomic force microscopy, laser Doppler vibrometers, and digital holography.…”

Section: Introductionmentioning

confidence: 99%

The Effect of Noise on Capacitive Measurements of MEMS Geometries

Chee

Clark

2011

Experimental and Applied Mechanics, Volume 6

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Small variations in the geometry of Micro Electro Mechanical Systems (MEMS) can yield very large variations in performance. Variations in geometry are a consequence of the MEMS fabrication process, and are unavoidable with current fabrication technology. To achieve quick, accurate, and precise measurements of MEMS geometry, we have previously reported on our pioneering use of capacitance to measure MEMS geometry. The ability to capacitively probe MEMS geometries has the potential to more precisely obtain geometric uncertainties, and to realize autonomous on-chip measurements in-the-field. The precision of measurement method depends on the precision of the capacitance meter, which is subject to various sources of noise. In this paper, we examine the effect of this noise using our off-chip capacitive measurement method. In our present approach, we consider four sources of noise and analyze how they individually contribute to the uncertainty in the extraction of MEMS geometry. The four sources of noise are: noise from the voltage source, internal noise of the capacitance meter, noise from external electromagnetic fields, and thermal noise. We verify our analytical results with simulation and validate our results with experiment. With off-chip capacitive probing, we find that the uncertainty in geometric extraction is most strongly affected by external electromagnetic fields, moderately affected by noise from the measurement equipment and thermal noise, and least affect by the applied voltage. We measure the uncertainty in geometry due to shielded and unshielded conditions, and we predict the uncertainty in geometry due to the voltage source and thermal noises.

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“…The phase information is of particular interest since it allows surface topography measurement with nanometer vertical resolution. Therefore, digital holography has been paid a widely attention in recent years [3][4][5][6][7][8][9][10] .The off-axis configurations, including the lensless Fourier transform and the Fresnel setups, are common configurations used to record digit holograms. One of the main advantages of the lensless Fourier transform holography is that the reconstructed intensity image is absolutely accurate [11][12] .…”

Section: Introductionmentioning

confidence: 99%

“…As an advanced optical diagnostic tool, digital holography allows to provide the phase information and the intensity information simultaneously within a sub-second [1][2][3][4][5] . The phase information is of particular interest since it allows surface topography measurement with nanometer vertical resolution.…”

Section: Introductionmentioning

confidence: 99%

High-resolution digital holography for shape measurement of microscopic object

et al. 2007

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Digital holography is particularly well suited for characterization of microstructure such as surface shape, surface nanostructures and surface roughness. The direct availability of both amplitude and phase information offers a range of versatile processing techniques that can be applied to complex field data, including phase imaging, which is particularly straightforward in digital holography. Based on digital off-axis lensless Fourier transform holographic configuration, the principle of topography by digital holography is analyzed. The wavefront deformation created by numerical Fresnel reconstruction is then studied. Thus the model of phase mask which is a parabolic function and related to the recording parameters is built. The phase mask can be obtained automatically by using digital hologram itself to evaluate automatically and accurately the values of the parameters involved by a curve-fitting procedures applied to the phase data extracted along two profiles, which are defined in the region where sample contributions are constant. The reconstructed wave field can be simply obtained by multiplying the phase mask with Fourier transform of the hologram. Both theoretical analysis and the simulation results show that the procedure proposed by Colomb is more suitable for phase reconstruction of digital off-axis lensless Fourier transform holography. Moreover, the correcting procedure can be applied to compensate high-order aberrations.

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MEMS metrology techniques

Cited by 27 publications

References 0 publications

Metrology, Inspection, and Process Control in Micro‐Scales

Metrology, Inspection, and Process Control in Micro‐Scales

The Effect of Noise on Capacitive Measurements of MEMS Geometries

High-resolution digital holography for shape measurement of microscopic object

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