Metal Anion–Alkyl Ammonium Complexes as Direct Write Precursors to Produce Nanopatterns of Metals, Nitrides, Oxides, Sulfides, And Alloys

Radha, Boya; Kiruthika, S.

doi:10.1021/ja2039612

Cited by 33 publications

(31 citation statements)

References 43 publications

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“…To a 200 µ L of ToABr (50 mM) solution, 25 µ L of AgNO3 (25 mM) solution and 10 µ L of HCl (110 mM) were added and stirred for 5 minutes [29]. It may be noted that ToABr is in excess amount to ensure effective phase transfer of Ag(I) to the organic layer.…”

Section: Preparation Of Agtoabr For the {100} Facets Etchingmentioning

confidence: 99%

Facet selective etching of Au microcrystallites

Mettela

2015

Nano Res.

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Selectively, the {100} and {111} facets of Au microcrystallites are etched using a capping method. The specific etchants etch the facets that are free of capping agents and produce crystallites with well-defined corrugation involving high-index microfacets. Such facets exhibit enhanced Raman activity compared to smooth facets. Provide the authors' website if possible. ABSTRACTHigh symmetry crystals, by nature, exhibit isotropic properties. Inducing anisotropy for example by facet selective etching, is considered implausible in face centered cubic (FCC) metals, particularly in gold, which besides being FCC, is also noble. Here, for the first time, facet selective etching of Au microcrystals obtained in the form of cuboctahedrons and pentagonal rods from thermolysis of a gold-organic precursor is reported. The selective etching of {111} and {100} facets has been achieved via a capping method. In this method, tetraoctylammonium cations selectively cap the {111} facets, while Br -ions protect the {100} facets. The exposed facets are oxidized by O2/Cl -, producing a variety of interesting geometries. Facet selective etching of Au microcrystallites is governed only by the nature of the facets as geometry does not seem to play any significant role. Etched surfaces appear rough but a closer examination reveals well-defined corrugations indexable to high hkl values. Such surfaces exhibit enhanced Raman activity.

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Section: Preparation Of Agtoabr For the {100} Facets Etchingmentioning

confidence: 99%

Facet selective etching of Au microcrystallites

Mettela

2015

Nano Res.

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“…Direct-write lithography is typically used for microoptics and microfluidics, 48 and here we extend it for the preparation of composite patterns for potential utility in flexible electronics and biomedical implants. The principle difference needs to be noted between the direct patterning techniques when the materials is directly deposited/removed 59 or photomodified 34,58 and the methods associated with direct-write lithography. The latter term is commonly reserved for maskless methods involving photoresists and is the technique used here.…”

Section: Results and Discissionmentioning

confidence: 99%

Direct-write maskless lithography of LBL nanocomposite films and its prospects for MEMS technologies

Bai

Kotov

2012

Nanoscale

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Application of nanocomposites in MEMS, flexible electronics, and biomedical devices is likely to demonstrate new performance standards and resolve a number of difficult technical problems enabled by the unique combinations of electrical, optical, and mechanical properties. This study explores the possibility of making microscale nanocomposite patterns using the fusion of two highly versatile techniques: direct-write maskless UV patterning and layer-by-layer assembly (LBL). Together they can be applied to production of a wide variety of nanostructured coatings with complex patterns. Single-walled carbon nanotube (SWNT) and gold nanoparticle LBL nanocomposites assembled with chitosan (CH) were made into prototypical patterns such as concentric helices and bus-line-and-stimulation pads (BLASP) used in flexible antennas and neuroprosthetic devices. The spatial resolution of the technique was established with the standard line grids to be at least 1μm. Gold nanoparticle films revealed better accuracy and higher resolution in direct-write patterning than SWNT composites possibly due to the granular rather than fibrous nature of the composites. The conductivity of the patterned composites was 6.45×10−5 Ω·m and 3.80×10−6 Ω·m at 20°C for nanotube and nanoparticle composites, respectively; in both cases it exceeds electrical parameters of similar composites. Fundamental and technological prospects of nanocomposite MEMS devices in different areas including implantable biomedical, sensing, and optical devices are discussed.

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“…[7,8] Soft lithography utilizing elastic stamps enables the direct fabrication of patterned scaffolds, resulting in the fabrication of metal films using electroless deposition. [9,10] Self-assembly is also used to fabricate the scaffolds from phase-separated mixed Langmuir-Blodgett films. [11][12][13] These techniques are based on the fabrication of metal growth sites on solid substrates followed by the fabrication of metal films using electroless deposition.…”

Section: Introductionmentioning

confidence: 99%

Patterning of Cu thin films on layer-by-layer films of anionic polymer and TiO<sub>2</sub> nanoparticles on plastic sheets

Watanabe

Morimoto

Yanagida

et al. 2014

Trans. Mat. Res. Soc. Japan

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We report a technique of direct patterning of Cu thin films on Pd nanoparticles photodeposited on layer-by-layer (LbL) films consisting of sodium polystyrene sulfonate (PSS) and TiO 2 nanoparticles on plastic sheets. The LbL films were formed on plastic sheets by soaking the plastic sheets alternately in PSS acidic solution and TiO 2 nanoparticle dispersion. The amounts of PSS and TiO 2 nanoparticles in the LbL films were proportional to the number of immersion. Pd nanoparticles were formed on the PSS/TiO 2 LbL films by irradiation with UV light through metal masks in acidic solution of palladium chloride. The amount of the Pd nanoparticles increased with increasing UV irradiation time. Cu films were deposited selectively on the Pd nanoparticles in the electroless plating bath of Cu. The results of the energy dispersive X-ray analysis and the elemental mapping were consistent with the above results. With an increase in the layer number of the LbL films, the growth rate of Cu films increased probably due to an increase in the amount of Pd nanoparticles on the LbL films. This technique allows for the reduced material consumption and fabrication steps in direct metal patterning on plastic sheets using light irradiation.

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Metal Anion–Alkyl Ammonium Complexes as Direct Write Precursors to Produce Nanopatterns of Metals, Nitrides, Oxides, Sulfides, And Alloys

Cited by 33 publications

References 43 publications

Facet selective etching of Au microcrystallites

Facet selective etching of Au microcrystallites

Direct-write maskless lithography of LBL nanocomposite films and its prospects for MEMS technologies

Patterning of Cu thin films on layer-by-layer films of anionic polymer and TiO<sub>2</sub> nanoparticles on plastic sheets

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