“…Unfortunately, dry etching techniques [14,15], the dominant etching process for Herein, in this study, the uniform micro-sized trench arrays with controllable tilting profiles were reported using a metal-assisted chemical etching (MaCE) process [16][17][18][19]. To the best of our knowledge, this is the first report on realizing the Si micro-trenches with tunable tilting angles of trench sidewalls.…”