“…Epitaxial nickelate thin films are usually deposited on LaAlO 3 (LAO) substrates by physical vapor deposition. Some recent studies on chemical solution deposition (CSD) of epitaxial nickelate thin films have been reported, with comparable crystallinity and sharp MIT features. − CSD, as a non-vacuum deposition method, is suited to control the ratio of rare-earth elements and Ni by adjusting the weight of the solid precursors. ,,− LaNiO 3 (LNO) is the only member of the rare-earth nickelates that is metallic at all temperatures as it retains the rhombohedral lattice structure which maintains an efficient Ni–O–Ni orbital overlap for metallic conductance even at low temperatures. , A lot of effort has been devoted to obtaining thermally driven MIT in LNO, such as ultra-thin films with the thickness of a few unit cells, construction of superlattices, interface, orientation, or oxygen deficiency effects. − Here, we demonstrate that LNO can be electron-doped into an insulator with dramatic conductivity suppression regardless of the temperature. The LNO thin films were deposited by the CSD method and were systematically characterized to confirm the film quality.…”