Metal–organic chemical vapour deposition of thin films of cobalt on different substrates: study of microstructure

Pt, PtNi and PtCoNi film electrocatalysts prepared by chemical vapor deposition for the oxygen reduction reaction in 0.5M KOH

“…Electrocatalyst Films thickness was estimated by cross-sectional SEM (micrographs not shown) and was about 180-250 nm, in accordance with other films reported elsewhere [24,25]. Fig.…”

“…The films oxygen content (as confirmed later by EDAX) is due to the fact that film top surface is oxidized by air. Oxygen content can vary through film thickness [24,25]. Fig.…”

MOCVD growth and study of magnetic Co films

“…7 In depositing Co or bimetallic Co based films by means of MOCVD, one should use Co compounds whose structure does not include cobalt-oxygen bonds in order to avoid cobalt oxide formation. Several cobalt compounds with Co-C bonds, namely, Co 2 (CO) 8 , Co(C 5 H 5 ) 2 and their derivatives C 5 H 5 Co(CO) 2 , Co(CO) 3 NO and [Co 2 (CO) 6 (g 2 -Me 3 SiCCH)], were adopted as MOCVD precursors for Co film deposition. However, these compounds have some disadvantages that limiting their application: undesired reactions in the gas phase and low thermal stability in the condensed phase.…”

Half-sandwich cobalt complexes in the metal-organic chemical vapor deposition process

“…Furthermore, antibacterial coatings with thin cobalt films [8] or the application as catalyst nanoparticles for the growth of carbon nanotubes [9] are of interest. Such thin films are generated using different techniques including sputtering [10], electron beam evaporation [11,12], ALD (Atomic Layer Deposition) [13][14][15][16][17][18][19] and (MO)CVD (metal-organic chemical vapor deposition) [20][21][22][23]. Within the latter deposition technique, it could be shown that this process is capable of forming uniform cobalt films in a highly controlled manner .…”