“…Equations 1, 5 and 11 give the interfacial shear strength t c ¼ 20.8 MPa, where the elastic properties of the film, adhesive layer and substrate are E f ¼ 130 GPa, n f ¼ 0.27, E a ¼ 4.4 GPa, n a ¼ 0.44, E s ¼ 4.0 GPa, and n s ¼ 0.44. [27,28] Similarly, the interface delamination and film fracture occur when the maximum interfacial tensile (peeling) stress in Equation 7 and tensile stress in the film in Equation 10 reach the tensile strengths s c of the interface and s c Si of the silicon film, respectively, i.e.,…”