Method for exposure dose monitoring and control in scanning beam interference lithography

Song, Ying; Liu, Yujuan; Jiang, Shan; Zhu, Yang; Zhang, Liu; Liu, Zhaowu

doi:10.1364/ao.420870

Cited by 5 publications

(1 citation statement)

References 14 publications

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“…The impacts of the fringe density error on the grating parameters and exposure performance must be fully analyzed. The error threshold of fringe density should be determined to guide the SBIL system design 13,14 .…”

Section: Introductionmentioning

confidence: 99%

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Song,

Zhang,

Liu

et al. 2023

Ninth Symposium on Novel Photoelectronic Detection Technology and Applications

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Section: Introductionmentioning

confidence: 99%

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Song,

Zhang,

Liu

et al. 2023

Ninth Symposium on Novel Photoelectronic Detection Technology and Applications

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Laser self-reference technique for high-precision lithographic alignment

Shan,

Zhong,

et al. 2024

Advanced Laser Processing and Manufacturing VIII

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Achieving nanometer-level alignment precision in lithography is essential for the advancement of semiconductor manufacturing. This study introduces an innovative laser self-reference technique that leverages the interference of two coherent beams on a reflective grating with a matching period. By incorporating a wedge-shaped beam splitter, a reference interference fringe is generated, establishing a direct correlation between the incident interference pattern and the reference grating, thus enabling real-time spatial alignment monitoring. A theoretical model was developed to elucidate the phase relationship. The experimental apparatus comprised a high-precision laser system, a piezoelectric transducer (PZT) for minute phase adjustments, and a high-speed CMOS camera for instantaneous analysis. The technique was evaluated using three displacement inversion algorithms, with the image phase correlation algorithm outperforming the others, achieving control of deviations to below 3.2 nm. Laser self-referencing technology not only provides a nanoscale alignment method, but also meets the fine control required for multi-layer grating manufacturing, improving the quality and reliability of the lithography process, and addressing a critical challenge in the production of semiconductor chips.

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Active control technology of a diffraction grating wavefront by scanning beam interference lithography

Liu

Yang

et al. 2021

Opt. Express

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To fabricate plain holographic gratings with high wavefront quality and to obtain the wavefront required in varied line-space grating, an active control technology of a diffraction grating wavefront by modulating the phase distribution of the scanning-beam interference lithography system was proposed. Sinusoidal wavefront control is simulated, and the controlled wavefront being almost the same as the target wavefront. A photoresist grating was fabricated whose surface is uniform and the wavefront is ideally sinusoidal. The theoretical analysis and experimental results confirmed that the wavefront of the diffraction grating can be actively controlled by modulating the phase distribution of the scanning-beam interference lithography system.

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Method for exposure dose monitoring and control in scanning beam interference lithography

Cited by 5 publications

References 14 publications

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Theoretical analysis on the influence of fringe density error on varied-line-spacing grating patterned with scanning beam interference lithography

Laser self-reference technique for high-precision lithographic alignment

Active control technology of a diffraction grating wavefront by scanning beam interference lithography

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