2021
DOI: 10.1109/access.2021.3090472
|View full text |Cite
|
Sign up to set email alerts
|

Methodology for the Simulation of the Variability of MOSFETs With Polycrystalline High-k Dielectrics Using CAFM Input Data

Abstract: In this work, a simulation methodology, whose inputs are Conductive Atomic Force Microscope (CAFM) experimental data, is proposed to evaluate the impact of nanoscale variability sources related to the polycrystallization of high-k dielectrics (i.e., oxide thickness, tox, and charge density, ρox, fluctuations in the nanometer range) on the Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) variability. To simulate this variability, a Thickness And Charge MAp Generator (TACMAG) has been developed and use… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 40 publications
0
1
0
Order By: Relevance
“…Previously, we have applied VENDES to model MOS-FETs [12], FinFETs [13], gate-all-around (GAA) nanowire (NW) FETs [14] and nanosheet (NS) FETs [15], among others. As an example, Fig.…”
Section: D Semiconductor Device Modellingmentioning
confidence: 99%
“…Previously, we have applied VENDES to model MOS-FETs [12], FinFETs [13], gate-all-around (GAA) nanowire (NW) FETs [14] and nanosheet (NS) FETs [15], among others. As an example, Fig.…”
Section: D Semiconductor Device Modellingmentioning
confidence: 99%