2014
DOI: 10.1016/j.mee.2013.12.025
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Methods of simulating thin film deposition using spray pyrolysis techniques

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Cited by 50 publications
(26 citation statements)
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“…The GO and RGO films were deposited using SPT. It is a technique which uses a liquid source for thin film coating of the desired compound on to preheated substrates [21]- [24]. The deposition temperature was 200˚C while the distance between the nozzle and the substrate was 30 cm.…”
Section: Film Depositionmentioning
confidence: 99%
“…The GO and RGO films were deposited using SPT. It is a technique which uses a liquid source for thin film coating of the desired compound on to preheated substrates [21]- [24]. The deposition temperature was 200˚C while the distance between the nozzle and the substrate was 30 cm.…”
Section: Film Depositionmentioning
confidence: 99%
“…The decrease in film thickness may also be due to thermophoretic force which increases with increase in substrate temperature repelling the aerosols reaching the substrate surface [24]. Fig.…”
Section: Determination Of Band Gap Energymentioning
confidence: 99%
“…The reactive zone is, in the case of film deposition, the space near the surface of the hot substrate (a few millimeters above the surface of the substrate), or the furnace heated chamber, in the case of powder synthesis. Figure 2 shows a diagram of the different stages at which the droplet is subjected as it approaches the hot substrate for two cases a fixed droplet size and speed, different (increasing from A to D, Figure 2a) temperature of the substrate and fixed substrate temperature and speed of different droplet sizes (decreasing droplet size from A to D, Figure 2b) [23,24]. At low temperature (large initial droplet size), the solvent within the droplet is not completely vaporized and the liquid droplet hits the substrate and upon contact with it vaporizes leaving a ring-shaped dry precipitate on the substrate (process A).…”
Section: Spray Pyrolysis As Materials Synthesis Techniquementioning
confidence: 99%