Metrology study of structural transfer accuracy in fabrication of high-aspect-ratio microelectromechanical systems: From optical mask to polished electroplated parts

Malek, Chantal Khan; Wood, Robert L.; Dudley, Bruce W.; Genova, P.

doi:10.1116/1.590305

Cited by 4 publications

(2 citation statements)

References 14 publications

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“…• PMMA process is well established, reliable and allows fabrication of very high-aspect-ratio structures with high fidelity (Khan Malek et al 1998Malek et al , 2003Pantenburg et al 1998). We have fabricated grid structures up to 3 mm tall (aspect ratio over 100) using deep X-ray lithography and copper electroforming (Makarova et al 2002(Makarova et al , 2003(Makarova et al , 2004a.…”

Section: Methodsmentioning

confidence: 98%

Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming

et al. 2008

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Creatv MicroTech has developed unique fabrication techniques to make high precision, high-aspectratio metal microstructures to custom specifications. A lithography based fabrication method permits precise fabrication of various microstructures. Collimators and antiscatter grids with continuous, smooth, thin, parallel or focused septa have been fabricated using deep X-ray and optical lithography, combined with metal electroforming. Microfabrication of high-aspect-ratio structures, especially of relatively large areas, presents many challenges: specialized mask design and X-ray mask fabrication; resist preparation, optimal exposure parameters, post-exposure processing, electroforming, polishing, and final assembly. Here, we present microstructures of various designs that we fabricated and describe the challenges that had to be overcome.

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Section: Methodsmentioning

confidence: 98%

Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming

et al. 2008

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“…The first device permits 3D measurement while the other two methods allow only the surface to be laterally measured (2D). Some articles focus on the acuity of pattern transfer from the optical mask to the finished electroplated parts [1]. Before focussing on this task, this work will concentrate more on the metrology used.…”

Section: Introductionmentioning

confidence: 99%

Comparison of measurement methods for microsystem components: application to microstructures made by the deep x-ray lithography process (x-ray LIGA)

Meyer

Mäder

Saile

et al. 2009

Meas. Sci. Technol.

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The LIGA (a German acronym for lithography, electroplating and molding) process using highly parallel x-rays permits the production of a microstructure with still unique characteristics: high aspect ratio, high accuracy, high perpendicularity and lower roughness of the side wall. From a marketing point of view, this qualitative description might suffice to attract users to the technology. Regarding widespread commercialization and standardization of x-ray LIGA products, our goal is to establish a rigorous dimensional metrology for which we need to understand and quantify uncertainty, which is the key to accuracy. We report on our metrological study using a coordinate measurement machine (CMM) equipped with a fibre probe (3D measurements) which will be compared to two versions of lateral top-view measurements (2D/surface measurements): an optical microscope provided with a micrometric table and a CMM with an image processing sensor; these two types of measurement methods being complementary. In fact, microsystem technology requires measurements to be performed with precision and accuracy within the range of 0.1 μm. In this paper, we present an analysis and a discussion of both types of measurement systems. The precision and reproducibility of the CMM (with fibre probe) during a two-year study will be exposed; a calibrated series part is being measured every time the machine is used. In this case, the CMM is used as a comparator. Its accuracy and the calibration of the ball diameter using an etalon (ceramic gage block) will be exposed. Furthermore, by taking into account the results obtained by the measurement system analysis (MSA), we will show the measurement's impact on the process by taking as an example the fabrication of mm gold gears for watch industry; a quantitative description of process reproducibility and of the influence of processing parameters influence will be possible in the future.

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Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and -systems: a review

Malek

Saile

2004

Microelectronics Journal

238

111

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Metrology study of structural transfer accuracy in fabrication of high-aspect-ratio microelectromechanical systems: From optical mask to polished electroplated parts

Cited by 4 publications

References 14 publications

Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming

Fabrication of antiscatter grids and collimators for X-ray and gamma-ray imaging by lithography and electroforming

Comparison of measurement methods for microsystem components: application to microstructures made by the deep x-ray lithography process (x-ray LIGA)

Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and -systems: a review

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