2006
DOI: 10.1016/j.vacuum.2006.01.043
|View full text |Cite
|
Sign up to set email alerts
|

MHD flow control for plasma technology applications

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
15
0

Year Published

2012
2012
2024
2024

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 33 publications
(15 citation statements)
references
References 7 publications
0
15
0
Order By: Relevance
“…by Macheret et al [1], whereas the product of the electron and ion Hall parameter e i is negligible within the examined argon plasma flows. The electrical conductivity of the plasma is represented by , L is the characteristic length of the MHD system.…”
Section: Introductionmentioning
confidence: 61%
See 4 more Smart Citations
“…by Macheret et al [1], whereas the product of the electron and ion Hall parameter e i is negligible within the examined argon plasma flows. The electrical conductivity of the plasma is represented by , L is the characteristic length of the MHD system.…”
Section: Introductionmentioning
confidence: 61%
“…The IRS probe body has a diameter of 50 mm which justifies the introduction of the radius for the characteristic length in equation (1). Due the overall diameter of 50 mm the probe belongs to the so-called European standard.…”
Section: Probe Configurationmentioning
confidence: 99%
See 3 more Smart Citations