Micro-Disperse Particles in Plasmas: From Disturbing Side Effects to New Applications

Kersten, Holger; Deutsch, Hans‐Peter; Stoffels, E.; Stoffels, WW Winfred; Kroesen, G.M.W.; Hippler, R.

doi:10.1002/1521-3986(200111)41:6<598::aid-ctpp598>3.0.co;2-z

Cited by 73 publications

(44 citation statements)

References 65 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…6 For example, powder agglomeration ͑the ␥ regime͒ is often utilized in plasma enhanced chemical vapor deposition ͑PECVD͒, 7 since the powder enhanced plasma chemistry and lowered sheath potentials can lead to faster deposition rates and lower defect densities. 8 Processing of plasma produced and trapped or externally injected fine particles in plasmas can be useful in fabricating objects such as coated or layered grains with specific surface structure, color, and/or fluorescent properties, 1,9 or nanostructured surfaces with the required properties.…”

Section: -4mentioning

confidence: 99%

Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas

Denysenko

Ostrikov

et al. 2003

Journal of Applied Physics

View full text Add to dashboard Cite

Femtosecond laser guiding of a high-voltage discharge and the restoration of dielectric strength in air and nitrogen Phys. Plasmas 19, 123502 (2012) Compact high-speed reciprocating probe system for measurements in a Hall thruster discharge and plume Rev. Sci. Instrum. 83, 123503 (2012) On the streamer propagation in methane plasma discharges J. Appl. Phys. 112, 113301 (2012) One-dimensional hybrid-direct kinetic simulation of the discharge plasma in a Hall thruster Phys. Plasmas 19, 113508 (2012) Consideration of the electron energy distribution function shape in a Ar and N2 global model J. Appl. Phys. 112, 103303 (2012) Additional information on J. Appl. Phys. Management of nanosize powder particles via control of plasma parameters in a low-pressure SiH 4 discharge for silicon microfabrication technologies is considered. The spatial profiles of electron and positive/negative ion number densities, electron temperature, and charge of the fine particles are obtained using a self-consistent fluid model of the electronegative plasmas in the parallel plate reactor geometry. The model accounts for variable powder size and number density, powder-charge distribution, local plasma nonuniformity, as well as UV photodetachment of electrons from the nanoparticles. The relations between the equilibrium discharge state and powder properties and the input power and neutral gas pressure are studied. Methods for controlling the electron temperature and SiH 3 Ϫ anion ͑here assumed to be the powder precursor͒ density, and hence the powder growth process, are proposed. It is shown that by controlling the neutral gas pressure, input power, and powder size and density, plasma density profiles with high levels of uniformity can be achieved. Management of powder charge distribution is also possible through control of the external parameters.

show abstract

Section: -4mentioning

confidence: 99%

Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas

Denysenko

Ostrikov

et al. 2003

Journal of Applied Physics

View full text Add to dashboard Cite

show abstract

“…7. The resulting dissociation ratio (12) is in the order of 10 −3 , as the association possibility Γ H is expected to be close to 1. This value for D is comparable to the results measured in a capacitively coupled rf-discharge by Pipa et al [59] when extrapolated to a position close to the position of the confined particles near the electrode.…”

Section: Figure5: Particle Temperatures T µ and The Corresponding Temmentioning

confidence: 97%

“…In low pressure conditions, the behavior of the gas molecules is described in the Knudsen regime [11,12], where the energy loss density is linear in the gas pressure…”

Section: Energy Balance Of Particles In a Plasmamentioning

confidence: 99%

“…Beneath treating macroscopic wafers in plasmas, also the plasma-based synthesis and modification of nanoscopic or microscopic particles (powder) with specific properties offers a variety of new applications [6][7][8][9][10][11][12][13][14], which may involve the improvement of optical or mechanical properties for coatings [9,14], for sintering processes [10], disperse composite catalysts [6] or polymorphous solar cells [7,8].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

On the heating of nano- and microparticles in process plasmas

Maurer¹,

Kersten²

2011

J. Phys. D: Appl. Phys.

View full text Add to dashboard Cite

Determination and understanding of energy fluxes to nano-or microparticles, which are confined in process plasmas, is highly desirable because the energy balance results in an equilibrium particle temperature which may even initiate the crystallization of nanoparticles. A simple balance model has been used to estimate the energy fluxes between plasma and immersed particles on the basis of measured plasma parameters. Addition of molecular hydrogen to the argon plasma results in additional heating of the particles due to molecule recombination. The measured particle temperature is discussed with respect to appearing plasma-particle interactions which contribute to the particle's energy balance.

show abstract

“…Acrílico é transparente o que permite seu uso em dispositivos ópticos [97], Partículas podem ser tratadas em ambiente de plasma de modo a alterar as suas propriedades superficiais ou para produzir compósitos [105]. Existem diversas maneiras de se obter partículas e/ou compósitos; a partícula é inserida na região de plasma ou são produzidas durante o processo de plasma.…”

Section: Substratosunclassified

Uso de filmes obtido pela polimerização por plasma de tetraetilortossilicato na fabricação de dispositivos miniaturizados.

Carvalho¹

View full text Add to dashboard Cite

Micro-Disperse Particles in Plasmas: From Disturbing Side Effects to New Applications

Cited by 73 publications

References 65 publications

Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas

Nanopowder management and control of plasma parameters in electronegative SiH4 plasmas

On the heating of nano- and microparticles in process plasmas

Uso de filmes obtido pela polimerização por plasma de tetraetilortossilicato na fabricação de dispositivos miniaturizados.

Contact Info

Product

Resources

About