Micro-etching technology of high aspect ratio frameworks for electronic devices

Cho, Young-Rae; Oh, Jae-Yeol; Kim, Heui‐Soo; Jeong, Hwanseong

doi:10.1016/s0921-5107(99)00158-0

Cited by 10 publications

(5 citation statements)

References 10 publications

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“…1 For example, photoetchabe glass ceramics have been used for making high aspect ratio spacers in field emission displays ͑FED͒, gas electron multipliers as detectors, and microreactors. [2][3][4] To effectively machine microstructures in glass ceramics, it is desirable to find alternative methods that have distinctive advantages compared with conventional lithographic techniques. Laser-based fabrication in photoetchable glass ceramics has been studied for making miniature satellites and other microdevices.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of microstructures in photoetchable glass ceramics using excimer and femtosecond lasers

Kim

Berberoğlu

2004

J. Micro/Nanolith. MEMS MOEMS

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We discuss laser fabrication of microstructures in photoetchable glass ceramics called Foturan (Schott Company, Elmsford, NY). A KrF excimer laser (ϭ248 nm, ϭ25 ns) is used for surface micromachining, and a femtosecond laser (ϭ800 nm, ϭ80 fs) is used for fabricating 3-D structures. Important aspects of the machining, such as depth of machining resulting from different laser processing parameters and threshold laser fluences, are presented. A detailed analysis of the absorption process of both lasers in photoetchable glass ceramics is provided.

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Section: Introductionmentioning

confidence: 99%

Fabrication of microstructures in photoetchable glass ceramics using excimer and femtosecond lasers

Kim

Berberoğlu

2004

J. Micro/Nanolith. MEMS MOEMS

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“…The bottom layer of the structure was bonded to this heat-treated glass wafer by fusion-bonding technique (figure 9(F )). The temperature for the fusion bonding between glass wafers is 465 • C [39] that is lower than that of heat treatment. Therefore, fusion bonding and heat treatment can be carried out simultaneously.…”

Section: Fabrication Of a Microreactormentioning

confidence: 92%

“…The photosensitive glass is exposed to UV light at a wavelength of 310 nm and high temperature of 585 • C; then the exposed parts of the glass crystallize. The crystallized parts, when etched with a 10% solution of HF (hydrofluoric acid), have an etching rate up to 20 times higher than that of the vitreous regions [39]. The fabrication cost is relatively low, because the cost of anisotropic wet etching is cheaper than that of other anisotropic processes.…”

Section: Selection Of Wafer Materialsmentioning

confidence: 99%

“…By the absorption of UV light in the glass parts that is not protected by Cr mask, Ce 3 − was oxidized and the free electron recombined with Ag − to silver atom. During the heat treatment in a furnace that is maintained at 585 • C, crystallization occurred around silver nuclei forming Li 2 SiO 3 [39]. The bottom layer of the structure was bonded to this heat-treated glass wafer by fusion-bonding technique (figure 9(F )).…”

Section: Fabrication Of a Microreactormentioning

confidence: 99%

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Design, fabrication and testing of a catalytic microreactor for hydrogen production

Kim

Kwon

2006

J. Micromech. Microeng.

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A catalytic microreactor for hydrogen production was fabricated by anisotropic wet etching of photosensitive glass, which enables it to be a structure with high tight tolerance and high aspect ratio. As a reactor structure, a microchannel was used for improving heat and mass transfer in the reactor. The primary fuel source is methanol for a mobile device. Endothermic catalytic steam reforming of methanol was chosen for producing gaseous hydrogen. The Cu-based catalyst, Cu/ZnO, was prepared by the co-precipitation method and coated on the surface of the microchannel for methanol steam reforming. An overall microfabrication process was established for a MEMS-based catalytic microreactor. The fabricated reactor has a volume of 1.8 cm3 including the volume of the reaction chamber 0.3 cm3 and produced dry reformate with high hydrogen content, 73%. The hydrogen flow was 4.16 ml min−1, which can generate a power output of 350 mWe for a fuel cell.The page numbers of this article were corrected on 24 July 2006. The corrected electronic version is identical to the print version.

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“…Photoetchable glass, Foturan, developed by Schott 3 can be used to make feature sizes as small as 25 mm. Dietrich et al [27] and Cho et al [28] have discussed various applications of Foturan.…”

Section: Introductionmentioning

confidence: 99%