2008
DOI: 10.1007/s00411-008-0180-1
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Microchamber arrays for the identification of individual cells exposed to an X-ray microbeam

Abstract: To identify individual cells exposed to a X-ray microbeam in a cell population, we developed a biocompatible microchamber-array chip using UV lithography of photopolymer SU-8. The center-to-center distance between microchambers is 50 lm including a wall of 15 lm height. Using the microchamber-array chip, we performed tracking of individual exposed cells. Sample cells loaded in a microchamber array were selectively irradiated with the Xray microbeam under microscopic observation. All the irradiated cells were i… Show more

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Cited by 4 publications
(3 citation statements)
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“…SU-8 was chosen previously as a seat layer at the LNM to fabricate custom Petri dishes suitable for cell incubation and irradiation [8]. A similar design has been used for time-tracking living cells after X-rays irradiation [9]. Since the fabrication of the artificial cell sample requires a cell friendly material, SU-8 was chosen once more.…”
Section: Fabricationmentioning
confidence: 99%
“…SU-8 was chosen previously as a seat layer at the LNM to fabricate custom Petri dishes suitable for cell incubation and irradiation [8]. A similar design has been used for time-tracking living cells after X-rays irradiation [9]. Since the fabrication of the artificial cell sample requires a cell friendly material, SU-8 was chosen once more.…”
Section: Fabricationmentioning
confidence: 99%
“…1) has found widespread use in the microelectronics industry (Djakov et al, 2014), as well as in replica molding, as a mask for metallization on organic substrates, and, due to its transparency, as a structural material for optics (Balslev et al, 2006). SU-8 is a negative photoresist, and favored for HAR lithography, due to its high chemical and mechanical stability, wide variety of thicknesses attainable, and biocompatibility (Gutierrez-Rivera & Cescato, 2008; Kuchimaru et al, 2008; Kwon et al, 2009). SU-8 epoxy resin is developed at near-ultraviolet (UV) wavelengths where the photoresist has very low optical absorption, usually from 365–436 nm, which makes HAR photolithography of thick films possible.…”
Section: Introductionmentioning
confidence: 99%
“…The SU-8 is suitable for the production of a structure with a high aspect ratio by solidification through the exposure to UV light. It is widely used as a photofabrication material, which has good characteristics of optical transparency, manufacturability, biocompatibility, 11) and others. The CR-39 films were spin-coated with SU-8 photoresist (SU-8 3005, Kayaku Microchem).…”
Section: Introductionmentioning
confidence: 99%