Microfabrication of channels using an embedded mask in negative resist

Alderman, Byron; Mann, Chris; Steenson, D.P.; Chamberlain, J.M.

doi:10.1088/0960-1317/11/6/312

Cited by 39 publications

(26 citation statements)

References 5 publications

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“…Since the top layer has much high lithographic sensitivity, it can be exposed with a much lower effective energy density. Therefore, the top layer's exposure will not significantly affect the pattered bottom layer without commonly employing an embedded metal mask to prevent underlying SU-8 from a second exposure (Alderman et al 2001;Guerin et al 1997). The 3D structure can be obtained with a single develop in PEMEA.…”

Section: Su-8r and Pag-diluted Su-8 As Sacrificial Layer Materialsmentioning

confidence: 99%

In situ fabrication of SU-8 movable parts by using PAG-diluted SU-8 as the sacrificial layer

Ling

Lian

2006

Microsyst Technol

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In this paper we proposed a novel technology to make SU-8 movable parts in situ by using PAG-diluted SU-8 or SU-8R, a SU-8 solution with no photoacid generator (PAG) content, as the sacrificial layer. Since they are not or less sensitive to UV light the unexposed bottom layer in UV lithography will be dissolved to release the movable components during the final develop in PGMEA (Propylene Glycol Monomethyl Ether Acetate). The use of PAG-diluted SU-8 or SU-8R as a sacrificial layer offers several advantages including significant reduction in processing steps. It becomes the simplest technique currently available for in situ fabrication of SU-8 movable parts. In this paper the lithographic sensitivities of SU-8 as a function of the PAG concentration, detailed fabrication process and examples of fabricated SU-8 movable parts will be presented.

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Section: Su-8r and Pag-diluted Su-8 As Sacrificial Layer Materialsmentioning

confidence: 99%

In situ fabrication of SU-8 movable parts by using PAG-diluted SU-8 as the sacrificial layer

Ling

Lian

2006

Microsyst Technol

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“…Many previous articles have used method with development of the channel after enclosure [27,[32][33][34][35]. Both SU-8 [27,[32][33][34][35] and other adhesives that are more easily dissolved [32] have been developed to open the channels.…”

Section: Microchip Fabricationmentioning

confidence: 99%

“…Both SU-8 [27,[32][33][34][35] and other adhesives that are more easily dissolved [32] have been developed to open the channels. These methods have an advantage of avoiding the blocking of the microchannel during enclosure that is the main source of failure in the "bonding after channel development" approach.…”

Section: Microchip Fabricationmentioning

confidence: 99%

Fabrication of enclosed SU-8 tips for electrospray ionization-mass spectrometry

Tuomikoski¹,

Sikanen

Ketola

et al. 2005

Electrophoresis

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We describe a novel electrospray tip design for MS which is fabricated completely out of SU-8 photoepoxy. A three-layer SU-8 fabrication process provides fully enclosed channels and tips. The tip shape and alignment of all SU-8 layers is done lithographically and is therefore very accurate. Fabrication process enables easy integration of additional fluidic functions on the same chip. Separation channels can be made with exactly the same process. Fluidic inlets are made in SU-8 during the fabrication process and no drilling or other postprocessing is needed. Channels have been fabricated and tested in the size range of 10 microm x 10 microm-50 microm x 200 microm. Mass spectrometric performance of the tips has been demonstrated with both pressure-driven flow and EOF. SU-8 microtips have been shown to produce stable electrospray with EOF in a timescale of tens of minutes. With pressure driven flow stable spray is maintained for hours. Taylor cone was shown to be small in volume and well defined even with the largest channel cross section. The spray was also shown to be well directed with our tip design.

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“…Other microfabrication processes for polymers include photolithography, (Burns 1998;Harrison 2004;Haraldsson 2006;Lin 2002;Gadre 2004;Nijdam 2005;Liu et al 2003;Ribeiro et al 2005;Tay et al 2001;Lin et al 2002;Yu et al 2006;Metz et al 2004;Sato et al 2006;Agirregabiria et al 2005;Abgrall et al 2006;Yu et al 2006;Alderman et al 2001) casting, (McDonald et al 2000Whitesides et al 2001;Sia and Whitesides 2003;Gates et al 2005;Kumar and Whitesides 1993;Xia and Whitesides 1998;Kim et al 1996;Kim et al 1997) injection molding, (Giselbrecht et al 2006;McCormick et al 1997;Giboz et al 2007;Yu et al 2002;Hulme et al 2002;Svedberg et al 2003;Han et al 2003;Noerholm et al 2004;Ahn et al 2004;Xu et al 2005;Kim et al 2006;Mair et al 2006;Nikcevic et al 2007) microthermoforming, (Giselbrecht et al 2006), hot embossing (Armani and Liu 2000;Barker et al 2000;Becke...…”

Section: Introductionmentioning

confidence: 99%

Surface infusion micropatterning of elastomeric substrates

Chen

Lentz

Rhoades

et al. 2011

Microfluid Nanofluid

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Surface infusion micropatterning (SIM) is a novel microfabrication process for simultaneous topographical and chemical patterning of elastomeric substrates. The SIM process involves three steps: (1) infusion of a monomer into the substrate, (2) photopolymerization through a patterned contact mask, and (3) drying. For the first time, SIM is demonstrated to create wells and channels (typical depth 5-22 lm, width 20-200 lm) in two substrate materials, a crosslinked polydimethylsiloxane elastomer and a thermoplastic polyurethane elastomer. High-resolution surface features produced include a ''checkerboard'' well pattern and a microfluidic channel system. The surface micropatterns have been characterized by scanning electron microscopy, optical microscopy, and optical profilometry to quantify channel depth and shape. Because of wall curvature effects, SIM is most suitable for producing shallow (aspect ratio \0.5) microfluidic channels in soft elastomeric materials. Due to the different chemical composition of the interpenetrating polymer network formed in the exposed regions, SIM also produces surface chemical patterning, as illustrated by selective dyestaining experiments. The potential for SIM to impact emerging technologies is discussed in the light of process advantages and limitations.

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Microfabrication of channels using an embedded mask in negative resist

Cited by 39 publications

References 5 publications

In situ fabrication of SU-8 movable parts by using PAG-diluted SU-8 as the sacrificial layer

In situ fabrication of SU-8 movable parts by using PAG-diluted SU-8 as the sacrificial layer

Fabrication of enclosed SU-8 tips for electrospray ionization-mass spectrometry

Surface infusion micropatterning of elastomeric substrates

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