Microfabrication of surface acoustic wave device using UV LED photolithography technique

Bing, Chu Yih; Mohanan, Ajay Achath; Saha, Tridib; Ramanan, Ramakrishnan Nagasundara; Parthiban, Rajendran; Ramakrishnan, N.

doi:10.1016/j.mee.2014.03.011

Cited by 18 publications

(7 citation statements)

References 10 publications

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“…Here, it is noteworthy that the near UV light (405 nm) detection is of high interest because of recently commercialized high-power UV light-emitting diode (UV LED) systems, which are compact and have long lifetimes so that they are expected to replace conventional UV lamps for photolithography and curing processes. 44,45 As shown in the J-V curves (Fig. 3), the current density was greatly increased (negatively) as the incident light intensity (P IN ) increased irrespective of wavelength and composition.…”

Section: Resultsmentioning

confidence: 84%

Solution-processable all-small molecular bulk heterojunction films for stable organic photodetectors: near UV and visible light sensing

et al. 2015

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Section: Resultsmentioning

confidence: 84%

Solution-processable all-small molecular bulk heterojunction films for stable organic photodetectors: near UV and visible light sensing

et al. 2015

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“…LED technology has accelerated enormously, in large part due to their widespread adoption as long‐lived, highly efficient, and environmentally friendly light sources. Advances in semi‐conductor optoelectronic materials research have led to the development of LEDs that have extended deeper into the UV range . LEDs are commercially available with built‐in focusing optics and with output wavelengths between 240 and 950 nm.…”

Section: Figurementioning

confidence: 99%

Ultraviolet Photodissociation Induced by Light‐Emitting Diodes in a Planar Ion Trap

et al. 2016

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The first application of light-emitting diodes (LEDs) for ultraviolet photodissociation (UVPD) mass spectrometry is reported. LEDs provide ac ompact, low cost light source and have been incorporated directly into the trapping cell of an Orbitrap mass spectrometer.M S/MS efficiencies of over 50 % were obtained using an extended irradiation period, and UVPD was optimizedb ym odulating the ion trapping parameters to maximizet he overlap between the ion cloud and the irradiation volume.Supportinginformation and the ORCID identification number(s) for the author(s) of this article can be found under: http://dx.

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“…Recently, there have been efforts to create a more accessible and affordable 3D microfabrication system by replacing the mercury-vapor bulb based UV light source with UV-LEDs [13][14][15]. UV-LEDs with emission peaks ranging from 360-405 nm have been utilized as alternative light sources for UV lithography.…”

Section: Introductionmentioning

confidence: 99%

“…UV-LEDs with emission peaks ranging from 360-405 nm have been utilized as alternative light sources for UV lithography. An array of 100 UV-LEDs with 405 nm peak wavelength was introduced as a UV lithography light source and submicron features of 200 nm over 4 inch Si wafers were demonstrated [13]. In this system, a diffuser was employed at the UV-LED array to provide uniform UV light intensity.…”

Section: Introductionmentioning

confidence: 99%

Computer numerical control (CNC) lithography: light-motion synchronized UV-LED lithography for 3D microfabrication

Kim

Yoon

Allen

2016

J. Micromech. Microeng.

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This paper presents a computer-numerical-controlled ultraviolet light-emitting diode (CNC UV-LED) lithography scheme for three-dimensional (3D) microfabrication. The CNC lithography scheme utilizes sequential multi-angled UV light exposures along with a synchronized switchable UV light source to create arbitrary 3D light traces, which are transferred into the photosensitive resist. The system comprises a switchable, movable UV-LED array as a light source, a motorized tilt-rotational sample holder, and a computercontrol unit. System operation is such that the tilt-rotational sample holder moves in a pre-programmed routine, and the UV-LED is illuminated only at desired positions of the sample holder during the desired time period, enabling the formation of complex 3D microstructures. This facilitates easy fabrication of complex 3D structures, which otherwise would have required multiple manual exposure steps as in the previous multidirectional 3D UV lithography approach. Since it is batch processed, processing time is far less than that of the 3D printing approach at the expense of some reduction in the degree of achievable 3D structure complexity. In order to produce uniform light intensity from the arrayed LED light source, the UV-LED array stage has been kept rotating during exposure. UV-LED 3D fabrication capability was demonstrated through a plurality of complex structures such as V-shaped micropillars, micropanels, a micro-'hi' structure, a micro-'cat's claw,' a micro-'horn,' a micro-'calla lily,' a micro-'cowboy's hat,' and a micro-'table napkin' array.

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Microfabrication of surface acoustic wave device using UV LED photolithography technique

Cited by 18 publications

References 10 publications

Solution-processable all-small molecular bulk heterojunction films for stable organic photodetectors: near UV and visible light sensing

Solution-processable all-small molecular bulk heterojunction films for stable organic photodetectors: near UV and visible light sensing

Ultraviolet Photodissociation Induced by Light‐Emitting Diodes in a Planar Ion Trap

Computer numerical control (CNC) lithography: light-motion synchronized UV-LED lithography for 3D microfabrication

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