“…Field effect mobility is one of the critical parameters for the characterization of two-dimensional semiconductor materials. The mobility can be estimated using the following equation:
where
is the transconductance, C ox is the gate capacitance (1.12 × 10 −8 F cm −2 for 285 nm SiO 2 ), 45 L ch and W ch are the MoS 2 channel length and width, respectively, and V d is the drain voltage. In this experiment, a L ch of 7.8 μm, a W ch of 5.9 μm, and a V d of 50 mV were determined.…”