1995
DOI: 10.1116/1.588297
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Micromachining applications of a high resolution ultrathick photoresist

Abstract: This article describes a new negative-tone photoresist, SU-8, for ultrathick layer applications. An aspect ratio of 10:1 has been achieved using near-ultraviolet lithography in a 200-μm-thick layer. The use of this resist for building tall micromechanical structures by deep silicon reactive-ion etching and electroplating is demonstrated. Using SU-8 stencils, etched depths of ≳200 μm in Si and electroplated 130-μm-thick Au structures with near-vertical sidewalls have been achieved.

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Cited by 392 publications
(242 citation statements)
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“…These devices have shown potential for characterizing and sorting cells and micro-organisms [9][10][11][12] as well as for solid-state electrohydrodynamic pumping of liquid [13]. The fabrication of large-area twDEP devices has been presented previously [9] and many of the relevant fabrication technologies are available in the literature [14][15][16][17][18]. The twDEP devices incorporate microelectrode arrays fabricated using multilayer fabrication techniques with sealed planar microfluidic channels, including sample inlets and outlets.…”
Section: Introductionmentioning
confidence: 99%
“…These devices have shown potential for characterizing and sorting cells and micro-organisms [9][10][11][12] as well as for solid-state electrohydrodynamic pumping of liquid [13]. The fabrication of large-area twDEP devices has been presented previously [9] and many of the relevant fabrication technologies are available in the literature [14][15][16][17][18]. The twDEP devices incorporate microelectrode arrays fabricated using multilayer fabrication techniques with sealed planar microfluidic channels, including sample inlets and outlets.…”
Section: Introductionmentioning
confidence: 99%
“…The mechanical shadow-mask consist of a membrane and a rim made of the photoplastic material EPON-SU-8 [8]. First a 5-µm-thin membrane with the apertures patterns is made, and second, a 150-µm-thick mechanical rim, which sustains the membrane.…”
Section: Photo-plastic Shadow Maskmentioning
confidence: 99%
“…The main advantages of this microvalve design are that: (i) No extra energy source is required to close the fluidic path, hence the loaded device is highly portable; and (ii) the device can be built by PDMS replicas from photolithographically patterned SU-8 molds, allowing for microfabricating deep (up to 1 mm) channels with vertical sidewalls (i.e., the height of the features can be specified independently of their width) [11] and resulting in very precise features. The prototype device features two arrays of photolithographically defined nanoliter fluidic chambers and two individually controlled sets of microvalves.…”
Section: Introductionmentioning
confidence: 99%