Fe͑110͒ films were epitaxially grown on sapphire substrates using a Mo͑110͒ buffer layer in an ultrahigh-vacuum molecular-beam epitaxy system. The magnetic properties were examined ex situ by Brillouin light scattering and superconducting quantum interference device magnetometry. To determine the magnetic anisotropy constants the frequency of the Damon-Eshbach ͓J. Phys. Chem. Solids 19, 308 ͑1961͔͒ surface spin-wave mode was measured as a function of the in-plane angle between the external magnetic field and the Fe͓001͔ crystal axis. The angle-dependent frequency was fitted by a spin-wave model. We found that the easy axis of the cubic magnetocrystalline anisotropy K 1 and an additional uniaxial in-plane anisotropy K ʈ ͑2͒ are aligned parallel to the in-planeFe͓001͔ axis for Fe-layer thicknesses from 0.8 to 37 nm, with K 1 increasing and K ʈ ͑2͒ decreasing with increasing Fe thickness. Possible origins of the observed uniaxial anisotropy are discussed.