2020
DOI: 10.1002/jemt.23433
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Micromorphology analysis of TiO2 thin films by atomic force microscopy images: The influence of postannealing

Abstract: This work describes an analysis of titanium dioxide (TiO 2 ) thin films prepared on silicon substrates by direct current (DC) planar magnetron sputtering system in O 2 /Ar atmosphere in correlation with three-dimensional (3D) surface characterization using atomic force microscopy (AFM). The samples were grown at temperatures 200, 300, and 400 C on silicon substrate using the same deposition time (30 min) and were distributed into four groups: Group I (as-deposited samples), Group II (samples annealed at 200 C)… Show more

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Cited by 22 publications
(17 citation statements)
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“…It is important to mention that multiferroic materials contribute to the development of new scientific methods [20]. In addition, topographical maps obtained by AFM allow us to access several parameters, such as stereometric [21][22][23], fractal [24][25][26][27], multifractal [28][29][30], and power spectrum density (PSD) [23,31,32], which are very useful for characterization of surfaces at micro-or nanoscale. For this reason, exploring the nanoscale morphology of LuMnO 3 thin films can provide reliable answers about the effect of sintering temperature on the formation of its topography.…”
Section: Introductionmentioning
confidence: 99%
“…It is important to mention that multiferroic materials contribute to the development of new scientific methods [20]. In addition, topographical maps obtained by AFM allow us to access several parameters, such as stereometric [21][22][23], fractal [24][25][26][27], multifractal [28][29][30], and power spectrum density (PSD) [23,31,32], which are very useful for characterization of surfaces at micro-or nanoscale. For this reason, exploring the nanoscale morphology of LuMnO 3 thin films can provide reliable answers about the effect of sintering temperature on the formation of its topography.…”
Section: Introductionmentioning
confidence: 99%
“…These analyses extract a lot of information about the topography and analyze the surface of thin films quantitatively (Nezafat et al, 2019a; Solaymani et al, 2021; Ţălu et al, 2018). The stereometric (Mozaffari et al, 2020; Sobola et al, 2017; Solaymani et al, 2020) data as well as multifractal (Fattahi et al, 2020; Ţălu et al, 2017; Ţălu et al, 2020) and fractal (Nezafat et al, 2019b; Ţălu et al, 2018) analysis are able to characterize the microtexture and particular morphological characteristics of the 3D surface. In this regard, AFM images and new image processing methods provide significant information about nanoscaled configuration and topographic features (Dalouji et al, 2019; Mahmoodi et al, 2018.…”
Section: Introductionmentioning
confidence: 99%
“…presented TiO 2 thin films obtained by atomic layer deposition (ALD) and studied their topography by AFM using 2D and 3D modules. Ţălu, Achour, et al 33 . studied the morphology and microtexture of TiO 2 thin films deposited by RF‐Magnetron sputtering using AFM correlating stereometric parameters with their morphology.…”
Section: Introductionmentioning
confidence: 99%
“…deposited TiO 2 by electron beam ion assisted and evaluated its morphology using stereometric parameters and its fractal dimension. Moreover, many other studies have used AFM images associated with fractal theory to study complex systems of thin films 35–39 …”
Section: Introductionmentioning
confidence: 99%