2004
DOI: 10.1016/j.jphotochem.2004.04.040
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Micron- and submicron-sized surface patterning of silica glass by LIBWE method

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Cited by 52 publications
(26 citation statements)
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“…19) Figure 2(b) shows that well-defined patterned gratings of the "AIST" logo mark was formed upon the irradiation of DPSS laser at 266 nm with a Galvanometer scanner. Pure toluene was used as an organic solution.…”
Section: Microstructuring Of Silica Glass By Libwe Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…19) Figure 2(b) shows that well-defined patterned gratings of the "AIST" logo mark was formed upon the irradiation of DPSS laser at 266 nm with a Galvanometer scanner. Pure toluene was used as an organic solution.…”
Section: Microstructuring Of Silica Glass By Libwe Methodsmentioning
confidence: 99%
“…According to optical images monitored by time-resolved shadowgraph technique, the laser vaporization of toluene liquid showed shockwave propagation and vapour expansion at the interface between silica glass and toluene liquid 15,19,21,22,25,31,33) .…”
Section: Transient Pressure Measurement Of Toluene Vaporizationmentioning
confidence: 99%
“…Micro-fabrications of various transparent materials, such as silica glass [9,[12][13][14][15][16][18][19][20][21][22][23][24][25][26][27]29,30,34,35], quartz [10,25,28,[31][32][33], glasses (Pyrex, etc.) [26], calcium fluoride [12,25,32], magnesium fluoride [25], barium fluoride [32], fluorocarbon resin [11], and sapphire [17,25,32,36], have been reported.…”
Section: Introductionmentioning
confidence: 99%
“…[26], calcium fluoride [12,25,32], magnesium fluoride [25], barium fluoride [32], fluorocarbon resin [11], and sapphire [17,25,32,36], have been reported. Furthermore, various dye solutions, such as pyrene/acetone [9,10,12,13,17,18,19,[24][25][26][27][31][32][33], pyrene/tetrahydrofuran (THF) [11,33], pyrene/ tetrachloroethylene [25,26,28,29], pyrene/cyclohexane [25], pyrene/toluene [26][27][28][29][30], pyranine/water [14], naphthalenesulfonic acid/water [15,20,22], naphthalene/methyl methacrylate [34,35], phenolphthalein/N-methyl-2-pyrrolidone [36], and pure toluene [16,21,22,23], have been used in c...…”
Section: Introductionmentioning
confidence: 99%
“…Később szubmikrométeres periódusú (p=750 nm) rácsot készítettek SiO2 felszínébe, króm maszk leképezésével (19/b ábra) [70]. Hasonló mintázatokat hoztak létre ömlesztett kvarcban német kutatók, az általuk alkalmazott fázismaszk leképezéshez egy Schwarzschild-objektívet használva [71].…”
Section: áBra Libwe-vel öMlesztett Kvarcban Kialakított 10 µM Perióduunclassified