2011
DOI: 10.1007/s11090-011-9293-4
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Microstructural Characterization and Mechanical Property of Iridium Coating Produced by Double Glow Plasma

Abstract: Ir is the most interesting as an effective oxygen diffusion barrier for super hightemperature structural materials. In this study, an Ir coating, approximately 7 lm thick, was deposited onto Mo substrate by double glow plasma at substrate temperature of about 1,120 K in an argon atmosphere. The crystal orientation, morphology and mechanical property of the Ir coating were investigated by XRD, SEM, AFM, TEM, nanoindentation and scratch test. The results indicated that the (220)-oriented Ir coating was composed … Show more

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Cited by 24 publications
(8 citation statements)
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“…The preferred orientation of the coating was because of the initial nuclei preferred growth on the surface of the substrate. The (110)‐oriented Ir coating was rough, underdense, with void in the coating. The vigorous high‐energy ion bombardment broke and prevented the generation of the low energy (100) and (111) crystal faces.…”
Section: Resultsmentioning
confidence: 99%
“…The preferred orientation of the coating was because of the initial nuclei preferred growth on the surface of the substrate. The (110)‐oriented Ir coating was rough, underdense, with void in the coating. The vigorous high‐energy ion bombardment broke and prevented the generation of the low energy (100) and (111) crystal faces.…”
Section: Resultsmentioning
confidence: 99%
“…However, some surface failure phenomena, such as wear, often affect the service life of 45 steel (Liu et al , 2013; Ozsarac et al , 2007). Therefore, some techniques can be used to improve the surface properties of 45 steel, because wear and other failures are the first to occur on the surface of the material (Lin et al , 2018; Wu et al , 2011).…”
Section: Introductionmentioning
confidence: 99%
“…Also, long process times might be an issue regarding commercialization of the process. On the other hand, radio frequency (rf) magnetron sputtering, compared to e-beam evaporation, provides additional freedom in the choice of deposition parameters and thus allows for an extended and more precise control of the evolving microstructure of deposited films [21][22][23][24][25][26][27]. Especially, additional substrate biasing provides control over the ion energy and the ratio of the accelerated-ion flux to the flux of deposited neutral particles on the substrate surface.…”
Section: Introductionmentioning
confidence: 99%