2014
DOI: 10.1016/j.vacuum.2014.03.018
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Microstructural characterization of high-quality indium tin oxide films deposited by thermionically enhanced magnetron sputtering at low temperature

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Cited by 12 publications
(1 citation statement)
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“…Generally, C-ITO films are fabricated with in situ annealing during magnetron sputtering processes, forming narrow, vertically-developed columnar structures. [53,54] However, CE-ITO substrate was prepared by post-annealing, and had a broader columnar structure with flat surface morphology. PV parameters of PSCs show similar trends, and the related values maximize at 7.50 at.% Sn-doped CE-ITO.…”
Section: Resultsmentioning
confidence: 99%
“…Generally, C-ITO films are fabricated with in situ annealing during magnetron sputtering processes, forming narrow, vertically-developed columnar structures. [53,54] However, CE-ITO substrate was prepared by post-annealing, and had a broader columnar structure with flat surface morphology. PV parameters of PSCs show similar trends, and the related values maximize at 7.50 at.% Sn-doped CE-ITO.…”
Section: Resultsmentioning
confidence: 99%