“…The rapid development of IC technology towards high density, multifunction, miniaturization and low cost, desires the copper alloys having higher performances on the mechanical strength, the electrical conductivity, etc. 1,2 For example, the traditional copper alloys, including Cu-Fe-P, Cu-Ni-Si and Cu-Cr-Zr alloys, are hardly be used in the next generation of very-large-scale integration (VLSI) ICs, which requires a ultimate tensile strength (UTS) over 800 MPa and an electrical conductivity (EC) over 50.0% International Annealed Copper Standard (IACS). [3][4][5] To improve the mechanical and electrical properties of copper alloys, one or more alloying elements, such as Ti, Co, P, Mg, Cr, Zr, Be, and Fe, can be introduced.…”