Ceramic substrate metallization is widely used in electronic device packaging and ceramic circuit board. Currently used methods of ceramic metallization are thick film technology (TFC), activity metal blazing (AMB), direct bonded copper (DBC), and direct plated copper (DPC) etc Here we report a facile approach for the metallization of alumina substrate using an atmosphere plasma spray (APS) process. The APS-coated copper layer is dense, high purity, and attached very firmly with alumina How to cite this article: Liu G, Zhong X, Xing Y, Li T, Pan W. Surface resistivity and bonding strength of atmosphere plasma sprayed copper-coated alumina substrate.