“…Advancements in processing and cell technologies since the mid-2000s have paved the way for high-efficiency thin silicon devices to enter the market; [1] therefore, a revisiting of module reliability based on kerfless wafers is warranted. Detailed reviews of kerfless wafering technologies can be found in other studies, [1][2][3][4][5][6][7][8] and examples include implant and cleave, [4,9] exfoliation and spalling, [10][11][12][13][14][15] blade cut, [16] laser processes, [17] dendritic web growth, [18,19] string ribbon growth, [20][21][22] direct wafering, [23] the floating silicon method, [24,25] and epitaxial growth. [1,26,27] Epitaxial growth, for example, has shown 4.5 ms carrier lifetime and high (> 20%) efficiencies [26] and shows 4.6-7.0 ms carrier lifetime after phosphorus gettering (before, 1.9-4.3 ms), [27] though there is opportunity for further improvements.…”