Microstructural, optical, and magnetic properties of (Zn1−xMnx)O thin films grown on (0001) Al2O3 substrates

Effects of oxygen partial pressure during sputtering growth on physical properties of Zn0.93Mn0.07O thin films

“…, mirror-like surface is observed. This result is consistent with our previous report [14], and the growth mechanism of the mirror-like (Zn 1-x Mn x )O thin films are described in that report. However, when P O 2 is increased up to O 2 overpressure (i.e.…”

“…In addition, in our previous studies [14,15], we had observed that the ferromagnetic properties are strongly related to crystallographic properties corresponding to the microstructural aspect and the lattice distribution. Thus, the variation of surface textures of the (Zn 1-x Mn x )O thin films with varying P O 2 should be considered as a primary task.…”

“…the present result is in agreement with the value reported in literatures. The peak at 385 nm can be attributed to nearband-edge emission in the ZnO host material [16,17], and the peak at 404 nm can be attributed to group II vacancy (V II )-related emission [14]. The broad humps at the region around 500-525 nm are related to emission from oxygen vacancies [16,17].…”

“…The growth of a 700 nm thick (Zn 1Àx Mn x )O active layer onto a 40 nm thick (Zn 1Àx Mn x )O thin film, which had been grown on a (0 0 0 1) Al 2 O 3 substrate at 200 1C, was performed at the substrate temperature of 450 1C. The role of the buffer layer in detail has been reported elsewhere [14]. The P O 2 was varied by controlling the O 2 gas flow rate of mixture gases (Ar+O 2 ).…”

Correlation of magnetic properties with microstructural properties for columnar-structured (Zn1−xMnx)O/Al2O3 (0001) thin films

“…Among the various ZnO-based DMSs, (Zn 1Àx Mn x )O materials have intensively studied [12][13][14][15][16][17][18][19][20] because of the expectation of strong exchange coupling due to higher spin moment (Mn 2+ , S ¼ 5 2 ). Until now, many studies on the growth of ferromagnetic (Zn 1Àx Mn x )O thin films using pulsed-laser deposition [12], laser molecularbeam epitaxy [13], and radio frequency (RF) magnetron sputtering deposition [14] have been reported.…”