2006
DOI: 10.1016/j.jcrysgro.2005.10.012
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Effects of oxygen partial pressure during sputtering growth on physical properties of Zn0.93Mn0.07O thin films

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Cited by 19 publications
(5 citation statements)
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“…PL of ZnMnO was either not observed or consisted of a broad emission [18] or of a weak excitonic lines [19,20]. In all the cases the PL was rather weak, which led to the opinion that Mn acts as a "killer" of a visible PL in ZnO [11,20].…”
Section: Discussionmentioning
confidence: 99%
“…PL of ZnMnO was either not observed or consisted of a broad emission [18] or of a weak excitonic lines [19,20]. In all the cases the PL was rather weak, which led to the opinion that Mn acts as a "killer" of a visible PL in ZnO [11,20].…”
Section: Discussionmentioning
confidence: 99%
“…[7][8][9][10][11] The thickness of SI-films was ϳ700 nm, and the penetration depth of As dopants after completing the ion implantation process was confirmed to be ϳ520 nm by measurements of secondary ion mass spectroscopy. To obtain p-͑Zn 0.93 Mn 0.07 ͒O layers, as a primary task, high dose As + ͑1.0ϫ 10 16 cm −2 ͒ ions were implanted with low energy ͑70 keV͒ into SI-͑Zn 0.93 Mn 0.07 ͒O thin films, which had been grown on Al 2 O 3 ͑0001͒ substrates by reactive rf magnetron sputtering under gas mixture of Ar and O 2 .…”
mentioning
confidence: 90%
“…The growth kinetics and material properties in detail of the semi-insulating (Zn 0.93 Mn 0.07 )O layer were described in our previous reports [4,5]. The As + ion implantation into the semi-insulating (Zn 0.93 Mn 0.07 )O layer was performed at the beam acceleration energy of 70 keV, and the dose of As + ion was 1.0 × 10 16 cm − 2 .…”
Section: Methodsmentioning
confidence: 99%