2016
DOI: 10.1016/j.jallcom.2016.06.278
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Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering

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Cited by 42 publications
(11 citation statements)
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“…Similar to our previous work, the lowest hydrogen absorption was found for the coating with mixed hcp-Cr 2 N and c-CrN phase composition due to the higher packing density of the cubic structure [13]. Zhou et al [43] observed for titanium nitride coatings that hydrogen impermeability of the coating also depends on the crystal orientation of the films. In order to prove this supposition, the texture coefficients of Cr 2 N T c (hkl) are calculated from their respective XRD peaks using the formula [44]:…”
Section: Crystalline Structuresupporting
confidence: 87%
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“…Similar to our previous work, the lowest hydrogen absorption was found for the coating with mixed hcp-Cr 2 N and c-CrN phase composition due to the higher packing density of the cubic structure [13]. Zhou et al [43] observed for titanium nitride coatings that hydrogen impermeability of the coating also depends on the crystal orientation of the films. In order to prove this supposition, the texture coefficients of Cr 2 N T c (hkl) are calculated from their respective XRD peaks using the formula [44]:…”
Section: Crystalline Structuresupporting
confidence: 87%
“…According to this, the coating with strong (110) texture should have the lowest hydrogen permeation. However, it could be suggested that crystal orientation is only one parameter influencing the permeation resistance of coatings together with film structure, presence of mixing phases, and packing density of the structure [13,43]. Hydrogen permeation depends on the crystal orientation within the films.…”
Section: Crystalline Structurementioning
confidence: 99%
“…It could be concluded that the presence of the c-CrN structure is preferable for hydrogen permeation resistant coatings due to a higher packing density of the cubic structure in comparison to the hexagonal structure [ 38 ]. Furthermore, preferred orientation of the deposited films strongly depends on the working pressure and could influence mechanical properties and hydrogen permeation, also [ 39 , 40 ].…”
Section: Resultsmentioning
confidence: 99%
“…Among the various PVD methods, the magnetron sputtering technique has a low deposition temperature, large deposition area, low impurity level, high deposition rate and superior bonding strength [10]. Metal or non-metal films can be deposited on substrates by selecting the appropriate sputtering process, different target materials and gas mixture [10][11][12][13].…”
Section: Introductionmentioning
confidence: 99%