Microstructure and load bearing capacity of TiN/NbN superlattice coatings deposited on medical grade CoCrMo alloy by HIPIMS

Hovsepian, P.Eh.; Sugumaran, Arunprabhu Arunachalam; Rainforth, Mark W.; Qi, Jiahui; Khan, Imran; Ehiasarian, Arutiun P.

doi:10.1016/j.jmbbm.2022.105267

Cited by 13 publications

(4 citation statements)

References 27 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…However, it requires in vivo despite this promise before clinical practice (patients) ( Huacho et al., 2017 ). Hovsepian et al. (2022) reported the structural response and load-bearing capacity of TiN/NbN superlattice coatings deposited on medical-grade CoCrMo alloy substrate.…”

Section: Futuristic Surface Modification Of Ti-based Dental Implantsmentioning

confidence: 99%

RETRACTED: Titanium and titanium alloys in dentistry: Current trends, recent developments, and future prospects

Hoque¹,

Showva²,

Ahmed³

et al. 2022

Heliyon

View full text Add to dashboard Cite

Section: Futuristic Surface Modification Of Ti-based Dental Implantsmentioning

confidence: 99%

RETRACTED: Titanium and titanium alloys in dentistry: Current trends, recent developments, and future prospects

Hoque¹,

Showva²,

Ahmed³

et al. 2022

Heliyon

View full text Add to dashboard Cite

“…[10][11][12][13][14] Recent developments in the deposition techniques, such as high impulse magnetron sputtering (HiPIMS) and its variations (dual HiPIMS, continuous-HPMS) and modulated pulsed power magnetron sputtering (MPP), are proposed and heavily investigated for less rough, defective, and more compact coatings. [15][16][17][18][19][20][21][22] Nevertheless, the corrosion protection ability of coatings deposited under standard, conventional methods is still limited.…”

Section: Introductionmentioning

confidence: 99%

Contribution of galvanic coupling with TiN, TiAlN, and CrN to the corrosion of steel in neutral and acidic chloride solutions

Avcı

Kazmanlı

Evren

et al. 2023

Materials & Corrosion

View full text Add to dashboard Cite

The inherent defective morphology of the physical vapor deposition (PVD) hard coatings limits their corrosion protective ability. We examined the impact of nitride‐based PVD coatings, including TiN, TiAlN, and CrN deposited on inert substrates by cathodic arc PVD method (CA‐PVD), on the galvanic corrosion of carbon steel. Their contribution was evaluated by zero‐resistance ammeter (ZRA) and electrochemical impedance spectroscopy (EIS) in 3.5 wt.% NaCl at pH 2 and 6, with and without aeration. The results indicated the prominent role of the coating type and the coupling environment on the generated galvanic currents. Immersion tests for the TiN‐, TiAlN‐, and CrN‐coated steel cross‐sections visually verified these results. The galvanic current contribution was distinct in environments where oxygen reduction is the dominant cathodic reaction. However, the layers' contribution to galvanic corrosion was minimal in deaerated acidic solutions, which is attributed to the high bonding strength of adsorbed intermediates to the coating surfaces.

show abstract

“…Magnetron sputtering is a widespread process for thin film deposition, allowing to tune in a wide range structural, electrical and mechanical properties of deposited films. Commonly known as Physical Vapor Deposition (PVD), the physical sputtering of a target under energetic ion bombardment generated by a plasma discharge is a process widely used in many technological domains such as microelectronics 1 , photovoltaics 2,3 , biology, 4,5 or mechanics, 6 among other fields. Moreover, adding a reactive gas such as oxygen or nitrogen 7-11, allows to enlarge the panel of deposited material and open the way to a wider range of materials and applications.…”

Section: Introductionmentioning

confidence: 99%

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

Zgheib,

Berthelot,

Tranchant

et al. 2023

Journal of Vacuum Science &Amp; Technology A

View full text Add to dashboard Cite

A high-power impulse magnetron sputtering (HiPIMS) power supply, called e-HiPIMS, has been developed and used to deposit chromium thin films within an argon discharge. This power supply comprises three stages; each can deliver a voltage pulse up to 300 V. The advantage of this power supply is the possibility of tailoring a pulse waveform on the cathode with several voltage levels. This e-HiPIMS can operate in the standard HiPIMS mode (s-HiPIMS) and multipulse HiPIMS mode. Each voltage sequence is independently managed regarding the width, delay, and voltage level. They can all be synchronized, giving the s-HiPIMS, or shifted in time and added to each other. Hence, the idea is to favor a specific ion population compared to others, according to the process needs and the targeted application. A beneficial example used a three-pulse sequence with different voltage levels. The influence of the temporal behavior on the plasma parameters, namely, currents and electron energy, has been studied for each pulse sequence. The results show that the discharge current stays within the same order of magnitude as in the standard HiPIMS. The reference current level can be obtained quickly, adding a short over-pulse, even if its voltage level is relatively low. Furthermore, measurements by the Langmuir probe reveal that a maximum electron density is obtained at 0.2 and 0.6 Pa of argon for a configuration that adds two distinguished voltage-pulse sequences, one between 5 and 15 μs and the other between 20 and 40 μs. It comes out that this e-HiPIMS sequence significantly increases the electron density.

show abstract

Microstructure and load bearing capacity of TiN/NbN superlattice coatings deposited on medical grade CoCrMo alloy by HIPIMS

Cited by 13 publications

References 27 publications

RETRACTED: Titanium and titanium alloys in dentistry: Current trends, recent developments, and future prospects

RETRACTED: Titanium and titanium alloys in dentistry: Current trends, recent developments, and future prospects

Contribution of galvanic coupling with TiN, TiAlN, and CrN to the corrosion of steel in neutral and acidic chloride solutions

Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge

Contact Info

Product

Resources

About