1999
DOI: 10.1109/77.784898
|View full text |Cite
|
Sign up to set email alerts
|

Microstructure and microwave surface resistance of YBaCuO thin films

Abstract: Epitaxial YBaCuO thin films on 73 mm diam. sapphire and 50 mm LaAlO3 wafers prepared for microwave applications were characterized by optical and electron microscopy as well as by X-ray diffraction in order to guide optimizing the film properties. The surface resistance R,, measured at 8.5, 19 or 145 GHz, partially as a function of microwave field amplitude B,, was taken as the key parameter. m i c a 1 results scaled quadratically in frequency to 0.25-0.75 mR at 10 GHz, 77 K, and low field levels. In case of s… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
4
0

Year Published

2001
2001
2024
2024

Publication Types

Select...
6
2
1

Relationship

0
9

Authors

Journals

citations
Cited by 15 publications
(4 citation statements)
references
References 8 publications
0
4
0
Order By: Relevance
“…The mismatch and the difference in thermal expansion coefficients prevents the preparation of thick films. In the case of YBCO the maximum thickness for crack-free films on CeO 2 buffered sapphire is mostly restricted to about 300 nm (see, for example, Kästner et al (1999) who produced YBCO films by pulsed laser deposition). By introducing structural defects into the YBCO films via a modification of the deposition parameters in the sputtering process Wördenweber et al (1999) succeeded in the preparation of YBCO films on CeO 2 buffered sapphire as thick as 700 nm.…”
Section: Tl-2212 On Sapphirementioning
confidence: 99%
“…The mismatch and the difference in thermal expansion coefficients prevents the preparation of thick films. In the case of YBCO the maximum thickness for crack-free films on CeO 2 buffered sapphire is mostly restricted to about 300 nm (see, for example, Kästner et al (1999) who produced YBCO films by pulsed laser deposition). By introducing structural defects into the YBCO films via a modification of the deposition parameters in the sputtering process Wördenweber et al (1999) succeeded in the preparation of YBCO films on CeO 2 buffered sapphire as thick as 700 nm.…”
Section: Tl-2212 On Sapphirementioning
confidence: 99%
“…The former is termed the critical current per unit width, I c /w, which is expressed as the product of the critical current density J c and the film thickness d. In order to derive a high value of I c /w, it is therefore necessary to obtain higher values of J c and/or thicker films. However, further increase of YBCO film thickness has been restricted by microcracking [5,6] which occurs beyond a critical value, a phenomenon that results from the difference in coefficient of thermal expansion between the sapphire substrate and the YBCO film. Hitherto the problem has been limited to improving the value of J c for films with thickness below the critical value, ascertained to be around the range of ∼0.3 µm.…”
Section: Introductionmentioning
confidence: 99%
“…Electron scattering is influenced by elements like material purity, temperature, and microwave field strength. Researchers and engineers aim for high-purity YBCO materials and precise operating conditions to minimize electron scattering effects [34].…”
Section: Electron Scatteringmentioning
confidence: 99%