Microstructure and optical properties of TiO2 thin films prepared by low pressure hot target reactive magnetron sputtering

Domaradzki, J.; Kaczmarek, Danuta; Prociów, E.; Borkowska, A.; Schmeißer, Dieter; Beuckert, Guido

doi:10.1016/j.tsf.2006.01.049

Cited by 68 publications

(30 citation statements)

References 23 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…For TiO2, tensile stress was again observed. The type of stress occurring in measured coatings was determined on the basis of the Δd parameter from the following equation [34]:…”

Section: Resultsmentioning

confidence: 99%

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

et al. 2016

View full text Add to dashboard Cite

Abstract:In this paper the influence of material composition on the structural, surface and optical properties of HfO 2 -TiO 2 mixed oxide coatings was investigated and discussed. Five sets of thin films were deposited using reactive magnetron sputtering: HfO 2 , TiO 2 and three sets of mixed HfO 2 -TiO 2 coatings with various titanium content. The change in the material composition had a significant influence on the structural, surface and optical properties. All of the deposited coatings, except for (Hf 0.55 Ti 0.45 )O x , were nanocrystalline with crystallites ranging from 6.7 nm to 10.8 nm in size. Scanning electron microscopy measurements revealed that surface of nanocrystalline thin films consisted of grains with different shapes and sizes. Based on optical transmission measurements, it was shown that thin films with higher titanium content were characterized by a higher cut-off wavelength, refractive index and lower optical band gap energy. The porosity and packing density were also determined.

show abstract

“…For TiO2, tensile stress was again observed. The type of stress occurring in measured coatings was determined on the basis of the Δd parameter from the following equation [34]:…”

Section: Resultsmentioning

confidence: 99%

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

et al. 2016

View full text Add to dashboard Cite

show abstract

“…Our results of hardness measurements for TiO 2 films as deposited in a standard sputtering process and having the anatase structure, have shown that the hardness of the film, directly after deposition, was about 3 GPa. Even after additional annealing at 800°C, which results in recrystalization of the anatase into the rutile structure [21], hardness of the film was only about 8 GPa. This confirms that the higher hardness value of the film was caused by an increase of the film nanocrystallinity.…”

Section: Resultsmentioning

confidence: 99%

Influence of nanocrystalline structure and composition on hardness of thin films based on TiO2

et al. 2011

View full text Add to dashboard Cite

Abstract:In this work, the influence of Tb-doping on structure, and especially hardness of nanocrystalline TiO 2 thin films, has been described. Thin films were formed by a high-energy reactive magnetron sputtering process in a pure oxygen atmosphere. Undoped TiO 2 -matrix and TiO 2 :Tb (2 at. % and 2.6 at. %) thin films, had rutile structure with crystallite sizes below 10 nm. The high-energy process produces nanocrystalline, homogenous films with a dense and close packed structure, that were confirmed by X-ray diffraction patterns and micrographs from a scanning electron microscope. Investigation of thin film hardness was performed with the aid of a nanoindentation technique. Results of measurements have shown that the hardness of all manufactured nanocrystalline films is above 10 GPa. In the case of undoped TiO 2 matrix, the highest hardness value was obtained (14.3 GPa), while doping with terbium results in hardness decreasing down to 12.7 GPa and 10.8 GPa for TiO 2 :(2 at. % Tb) and TiO 2 :(2.6 at. % Tb) thin films, respectively. Incorporation of terbium into TiO 2 -matrix also allows modification of the elastic properties of the films.

show abstract

“…Application of pure oxygen plasma as compared to conventional process results that prepared thin films were characterized by dense, homogeneous and stoichiometric structure [16,17]. However, in case of HE RMS, XRD investigations reveal presence of fine-crystalline rutile structure with preferred (110) plane orientation [21,22].…”

Section: Resultsmentioning

confidence: 99%

“…The processes applied by the authors termed as LP HTRS [16] and high HE RMS [12] employed combination of different operation modes used in modified sputtering processes [1,7,9]. In both processes thin films of TiO 2 were prepared under low pressure (0.1 Pa) of oxygen (purity 99.99%) plasma using titanium disc (purity 99.99%) 100 mm in diameter and 3.8 mm thick.…”

Section: Methodsmentioning

confidence: 99%

“…The collision of thermoemitted electrons with neutral oxygen atoms at the outer area of the target plays an important role in ionization process, allowing an increase in the process energy. The increase in target temperature favoured stability of discharge in transition mode and allowed one to obtain almost stoichiometric thin films [9,12,16]. The magnetron was powered by pulsed power supply working in the unipolar mode with 165 kHz sinusoidal pulses grouped with 1.6 kHz.…”

Section: Methodsmentioning

confidence: 99%

See 1 more Smart Citation

Study of Structure Densification in TiO₂Coatings Prepared by Magnetron Sputtering under Low Pressure of Oxygen Plasma Discharge

et al. 2011

Self Cite

View full text Add to dashboard Cite

Current work presents results of studies on structural and optical properties of the TiO2 thin films prepared by reactive magnetron sputtering. Oxide thin films were deposited from metallic targets using oxygen gas only instead of usually used mixture of Ar-O2. Additionally, an increased amplitude of unipolar pulses powering the magnetron has been applied. It is shown that all prepared coatings were stoichiometric and by changing only the discharge voltage it is possible to influence the resulting structural phase and optical properties of prepared thin films. Depending on conditions of magnetron powering, TiO2 thin films had either the anatase structure with refraction index n = 2.1 (λ = 500 nm) or a high temperature stable rutile structure with n = 2.52 (λ = 500 nm).

show abstract

Microstructure and optical properties of TiO2 thin films prepared by low pressure hot target reactive magnetron sputtering

Cited by 68 publications

References 23 publications

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

Influence of nanocrystalline structure and composition on hardness of thin films based on TiO2

Study of Structure Densification in TiO₂Coatings Prepared by Magnetron Sputtering under Low Pressure of Oxygen Plasma Discharge

Contact Info

Product

Resources

About

Microstructure and optical properties of TiO2 thin films prepared by low pressure hot target reactive magnetron sputtering

Cited by 68 publications

References 23 publications

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

Influence of Material Composition on Structural and Optical Properties of HfO2-TiO2 Mixed Oxide Coatings

Influence of nanocrystalline structure and composition on hardness of thin films based on TiO2

Study of Structure Densification in TiO2Coatings Prepared by Magnetron Sputtering under Low Pressure of Oxygen Plasma Discharge

Contact Info

Product

Resources

About

Study of Structure Densification in TiO₂Coatings Prepared by Magnetron Sputtering under Low Pressure of Oxygen Plasma Discharge