Microstructure and physical properties of nanofaceted antimony doped tin oxide thin films deposited by chemical vapor deposition on different substrates

Fluorine highly doped nanocrystalline SnO2 thin films prepared by SPD technique

“…They are widely used in the photovoltaic and the optoelectronic applications which required high transmission, low sheet resistance, high uniformity and larger substrate area [3,4]. Tin dioxide SnO2 is a crystalline solid with a tetragonal crystal lattice which is similar to the rutile structure and n-type semiconductor material.…”

“…Tin dioxide is a promising material for applications in gas sensors, photovoltaic solar energy conversion devices, and electrochromic device [2,4,9], electrocatalytic anodes, glass coatings for furnace windows as well as transparent electrodes for liquid crystal displays, flat-panel displays and defrosting windows [10,11]. SnO 2 and SnO 2 :F films have been fabricated using various technologies, including chemical vapor deposition CVD [3], spray pyrolysis [5,2,10], atomic layer deposition (ALD) [12], pulsed laser deposition (PLD) [8], RF sputtering [13], sol-gel technique [1]. In this study TO and FTO thin films were prepared by the spray pyrolysis technique, it is particularly attractive because of its simplicity.…”

The effect of substrate temperature on the microstructural properties of nanocrystalline tin oxide coatings produced by APCVD

“…Transparent conducting tin oxide thin films, either doped or undoped, are produced by several techniques. 1,2 Thin films of SnO 2 are used in a wide range of applications, e.g., electrodes in electroluminescent displays, imaging devices, protective coatings, antireflection coatings, gas and chemical sensors, transducers, and applications based on transparent conductors including heating windows for aircraft and cars and incandescent lamps, solar cells, and other optoelectronic devices. [3][4][5][6][7][8] Various methods, including RF sputtering, electron beam evaporation, spray pyrolysis, photochemical vapor deposition, the sol-gel method, and atmospheric pressure chemical vapor deposition (APCVD), have been used to deposit these films.…”

Effects of Sb, Zn doping on structural, electrical and optical properties of SnO2 thin films

“…Tin oxide can exist in two structures belonging to direct and indirect optical transitions, with different band gaps; a direct band gap that ranges from 3.6 to 4.6 eV [21] at room temperature and indirect bandgap of about 2.6 eV [22]. It has been reported that in presence of antimony (Sb) or zinc (Zn) dopants tin dioxide SnO 2 displays low resistivity and remains transparent in wavelength that includes the visible region [23][24][25].…”